Laser-induced damage of fused silica on high-power laser: beam intensity modulation, optics defect, contamination

Author(s):  
Dongfeng Zhao ◽  
Mingyin Sun ◽  
Rong Wu ◽  
Xinqiang Lu ◽  
Zunqi Lin ◽  
...  
2009 ◽  
Vol 29 (3) ◽  
pp. 756-760 ◽  
Author(s):  
唐顺兴 Tang Shunxing ◽  
欧阳小平 Ouyang Xiaoping ◽  
朱宝强 Zhu Baoqiang ◽  
林尊琪 Lin Zunqi

2018 ◽  
Vol 6 ◽  
Author(s):  
Jing Wang ◽  
Chunhong Li ◽  
Wenjie Hu ◽  
Wei Han ◽  
Qihua Zhu ◽  
...  

Boron nitride (BN) nanosheets incorporated silica antireflective (AR) coating was successfully prepared on fused silica substrate to improve the antilaser-damage ability of transmissive optics used in high-power laser systems. The BN nanosheets were obtained by urea assisted solid exfoliation, and then incorporated into basic-catalyzed silica sols without any further treatment. The transmission electron microscope (TEM) images indicated that the BN nanosheets generally consisted of 2–10 layers. The antireflective BN/$\text{SiO}_{2}$ coating exhibited excellent transmittance as high as 99.89% at 351 nm wavelength on fused silica substrate. The thermal conductivity $0.135~\text{W}\cdot \text{m}^{-1}\cdot \text{K}^{-1}$ of the BN/$\text{SiO}_{2}$ coating with 10% BN addition was about 23% higher than $0.11~\text{W}\cdot \text{m}^{-1}\cdot \text{K}^{-1}$ of the pure $\text{SiO}_{2}$ AR coating. The laser-induced damage threshold (LIDT) of that BN/$\text{SiO}_{2}$ coating is also 23.1% higher than that of pure $\text{SiO}_{2}$ AR coating. This research provides a potential application of BN/$\text{SiO}_{2}$ coatings in high-power laser systems.


2016 ◽  
Vol 65 (24) ◽  
pp. 246102
Author(s):  
Han Wei ◽  
Feng Bin ◽  
Zheng Kui-Xing ◽  
Zhu Qi-Hua ◽  
Zheng Wan-Guo ◽  
...  

1993 ◽  
Vol 24 (5) ◽  
pp. 193-199
Author(s):  
L Junchang ◽  
C Vialle ◽  
J Merlin

2021 ◽  
Vol 68 (10) ◽  
pp. 415-421
Author(s):  
Takashi MIZOGUCHI ◽  
Takaya NAGAHAMA ◽  
Makoto TANO ◽  
Shigeru MATSUNAGA ◽  
Takayuki YOSHIMI ◽  
...  

2018 ◽  
Vol 7 (1-2) ◽  
pp. 23-31 ◽  
Author(s):  
Hao Liu ◽  
Lars Jensen ◽  
Ping Ma ◽  
Detlev Ristau

AbstractAtomic layer deposition (ALD) facilitates the deposition of coatings with precise thickness, high surface conformity, structural uniformity, and nodular-free structure, which are properties desired in high-power laser coatings. ALD was studied to produce uniform and stable Al2O3and HfO2single layers and was employed to produce anti-reflection coatings for the harmonics (1ω, 2ω, 3ω, and 4ω) of the Nd:YAG laser. In order to qualify the ALD films for high-power laser applications, the band gap energy, absorption, and element content of single layers were characterized. The damage tests of anti-reflection coatings were carried out with a laser system operated at 1ω, 2ω, 3ω, and 4ω, respectively. The damage mechanism was discussed by analyzing the damage morphology and electric field intensity difference. ALD coatings exhibit stable growth rates, low absorption, and rather high laser-induced damage threshold (LIDT). The LIDT is limited by HfO2as the employed high-index material. These properties indicate the high versatility of ALD films for applications in high-power coatings.


1984 ◽  
pp. 681-691
Author(s):  
M. Cantello ◽  
V. Donati ◽  
L. Garifo ◽  
R. Menin ◽  
F. Pandarese ◽  
...  

2009 ◽  
Vol 48 (4) ◽  
pp. 770 ◽  
Author(s):  
Juan M. Bueno ◽  
Brian Vohnsen ◽  
Luis Roso ◽  
Pablo Artal

Sign in / Sign up

Export Citation Format

Share Document