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EUV lithography: past, present and future
Extreme Ultraviolet (EUV) Lithography XII
◽
10.1117/12.2584527
◽
2021
◽
Author(s):
Jos P. Benschop
Keyword(s):
Euv Lithography
Download Full-text
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References
Introduction : Recent Activities of EUV Lithography
The Journal of the Institute of Electrical Engineers of Japan
◽
10.1541/ieejjournal.128.668
◽
2008
◽
Vol 128
(10)
◽
pp. 668-668
Author(s):
Hiroo KINOSHITA
Keyword(s):
Euv Lithography
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How to Improve ‘Chemical Stochastic’ in EUV Lithography ?
2020 China Semiconductor Technology International Conference (CSTIC)
◽
10.1109/cstic49141.2020.9282490
◽
2020
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Author(s):
Toru Fujimori
Keyword(s):
Euv Lithography
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Optimization of high average power FEL beam for EUV lithography
10.1117/12.2182239
◽
2015
◽
Cited By ~ 1
Author(s):
Akira Endo
Keyword(s):
Average Power
◽
High Average Power
◽
Euv Lithography
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Status of the liquid-xenon-jet laser-plasma source for EUV lithography
10.1117/12.472274
◽
2002
◽
Cited By ~ 20
Author(s):
Bjoern A. M. Hansson
◽
Lars Rymell
◽
Magnus Berglund
◽
Oscar E. Hemberg
◽
Emmanuelle Janin
◽
...
Keyword(s):
Laser Plasma
◽
Plasma Source
◽
Liquid Xenon
◽
Euv Lithography
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Toward the In Situ Remediation of Carbon Deposition on Ru-Capped Multilayer Mirrors Intended for EUV Lithography: Exploiting the Electron-Induced Chemistry
The Journal of Physical Chemistry C
◽
10.1021/jp074766y
◽
2007
◽
Vol 111
(33)
◽
pp. 12165-12168
◽
Cited By ~ 8
Author(s):
David J. Davis
◽
Georgios Kyriakou
◽
Robert B. Grant
◽
Mintcho S. Tikhov
◽
Richard M. Lambert
Keyword(s):
Carbon Deposition
◽
In Situ Remediation
◽
Multilayer Mirrors
◽
Euv Lithography
Download Full-text
Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography
10.1117/12.390100
◽
2000
◽
Cited By ~ 5
Author(s):
Takeo Watanabe
◽
Hiroo Kinoshita
◽
Atsushi Miyafuji
◽
Shigeo Irie
◽
Shigeru Shirayone
◽
...
Keyword(s):
Single Layer
◽
Chemically Amplified
◽
Euv Lithography
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Efficient multi-die placement for blank defect mitigation in EUV lithography
10.1117/12.918075
◽
2012
◽
Cited By ~ 8
Author(s):
Yuelin Du
◽
Hongbo Zhang
◽
Martin D. F. Wong
◽
Yunfei Deng
◽
Rasit O. Topaloglu
Keyword(s):
Euv Lithography
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Development of new phenylcalix[4]resorcinarene: its application to positive-tone molecular resist for EB and EUV lithography
10.1117/12.813487
◽
2009
◽
Cited By ~ 3
Author(s):
Masatoshi Echigo
◽
Dai Oguro
Keyword(s):
Euv Lithography
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Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography
10.1117/12.916093
◽
2012
◽
Cited By ~ 11
Author(s):
Junichi Fujimoto
◽
Tsukasa Hori
◽
Tatsuya Yanagida
◽
Takeshi Ohta
◽
Yasufumi Kawasuji
◽
...
Keyword(s):
Light Source
◽
Euv Lithography
◽
Laser Produced Plasma
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Negative-tone imaging (NTI) process for ArF immersion and EUV lithography to improve ‘Chemical Stochastic’
10.1109/iwaps54037.2021.9671060
◽
2021
◽
Author(s):
Toru Fujimori
Keyword(s):
Euv Lithography
◽
Negative Tone
Download Full-text
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