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Extreme Ultraviolet (EUV) Lithography XII
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Published By SPIE
9781510640511, 9781510640528
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Front Matter: Volume 11609
Extreme Ultraviolet (EUV) Lithography XII
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10.1117/12.2595815
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2021
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Keyword(s):
Matter Volume
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Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)
Extreme Ultraviolet (EUV) Lithography XII
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10.1117/12.2588788
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2021
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Author(s):
Safak Sayan
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Kishore K. Chakravorty
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Yusuke Teramoto
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Takahiro Shirai
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Shunichi Morimoto
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...
Keyword(s):
Mask Inspection
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28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography
Extreme Ultraviolet (EUV) Lithography XII
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10.1117/12.2584713
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2021
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Author(s):
Danilo De Simone
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Luka Kljucar
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Poulomi Das
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Romuald Blanc
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Christophe Beral
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...
Keyword(s):
Metal Oxide
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Single Exposure
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Euv Lithography
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Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations
Extreme Ultraviolet (EUV) Lithography XII
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10.1117/12.2584744
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2021
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Author(s):
Adam Lyons
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Luke Long
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Thomas I. Wallow
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Chris Spence
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Ton Kiers
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...
Keyword(s):
Monte Carlo
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Statistical Analysis
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Monte Carlo Simulations
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Large Scale
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The Impact
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EUV single exposure via patterning at aggressive pitch
Extreme Ultraviolet (EUV) Lithography XII
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10.1117/12.2582563
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2021
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Author(s):
Jing Guo
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Jennifer Church
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Luciana Meli
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Ekmini Anuja de Silva
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Martin Burkhardt
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...
Keyword(s):
Single Exposure
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CNT pellicles: Imaging results of the first full-field EUV exposures
Extreme Ultraviolet (EUV) Lithography XII
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10.1117/12.2584724
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2021
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Author(s):
Joost Bekaert
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Emily Gallagher
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Rik Jonckheere
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Lieve Van Look
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Remko Aubert
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...
Keyword(s):
Full Field
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Imaging Results
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Update of >300W high power LPP-EUV source challenge III for semiconductor HVM
Extreme Ultraviolet (EUV) Lithography XII
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10.1117/12.2581910
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2021
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Author(s):
Hakaru Mizoguchi
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Hiroaki Nakarai
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Tamotsu Abe
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Hiroshi Tanak
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Yukio Watanabe
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...
Keyword(s):
High Power
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EUV lithography: past, present and future
Extreme Ultraviolet (EUV) Lithography XII
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10.1117/12.2584527
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2021
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Author(s):
Jos P. Benschop
Keyword(s):
Euv Lithography
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Mask is key to unlock full EUVL potential
Extreme Ultraviolet (EUV) Lithography XII
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10.1117/12.2584583
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2021
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Author(s):
Vicky Philipsen
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Wafer heating analysis with pattern variation in EUVL
Extreme Ultraviolet (EUV) Lithography XII
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10.1117/12.2583917
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2021
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Author(s):
Wonyoung Choi
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Chung-Hyun Ban
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Hye-Keun Oh
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