Extreme Ultraviolet (EUV) Lithography XII
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9781510640511, 9781510640528
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Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)

2021 ◽  
Author(s):  
Safak Sayan ◽  
Kishore K. Chakravorty ◽  
Yusuke Teramoto ◽  
Takahiro Shirai ◽  
Shunichi Morimoto ◽  
...  
Keyword(s):  
Mask Inspection

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography

2021 ◽  
Author(s):  
Danilo De Simone ◽  
Luka Kljucar ◽  
Poulomi Das ◽  
Romuald Blanc ◽  
Christophe Beral ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Single Exposure ◽  
Euv Lithography

Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations

2021 ◽  
Author(s):  
Adam Lyons ◽  
Luke Long ◽  
Thomas I. Wallow ◽  
Chris Spence ◽  
Ton Kiers ◽  
...  
Keyword(s):  
Monte Carlo ◽  
Statistical Analysis ◽  
Monte Carlo Simulations ◽  
Large Scale ◽  
The Impact

EUV single exposure via patterning at aggressive pitch

2021 ◽  
Author(s):  
Jing Guo ◽  
Jennifer Church ◽  
Luciana Meli ◽  
Ekmini Anuja de Silva ◽  
Martin Burkhardt ◽  
...  
Keyword(s):  
Single Exposure

CNT pellicles: Imaging results of the first full-field EUV exposures

2021 ◽  
Author(s):  
Joost Bekaert ◽  
Emily Gallagher ◽  
Rik Jonckheere ◽  
Lieve Van Look ◽  
Remko Aubert ◽  
...  
Keyword(s):  
Full Field ◽  
Imaging Results

Update of >300W high power LPP-EUV source challenge III for semiconductor HVM

2021 ◽  
Author(s):  
Hakaru Mizoguchi ◽  
Hiroaki Nakarai ◽  
Tamotsu Abe ◽  
Hiroshi Tanak ◽  
Yukio Watanabe ◽  
...  
Keyword(s):  
High Power

EUV lithography: past, present and future

2021 ◽  
Author(s):  
Jos P. Benschop
Keyword(s):  
Euv Lithography

Mask is key to unlock full EUVL potential

2021 ◽  
Author(s):  
Vicky Philipsen

Introduction of fully automated EUV pellicle mounter and demounter (EPMD)

2021 ◽  
Author(s):  
Dongyoung Shin ◽  
Seongyong Moon ◽  
Sungchul Jeon ◽  
Sunwoo Lee
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