Far-field pattern analysis of extended-hemispherical-lens/objective-lens antenna system at millimeter wavelengths

1998 ◽  
Author(s):  
Wenbin Dou ◽  
Zhong Liang Sun ◽  
G. Zeng
2011 ◽  
Vol 19 (27) ◽  
pp. 26752 ◽  
Author(s):  
Alessio Benedetti ◽  
Marco Centini ◽  
Mario Bertolotti ◽  
Concita Sibilia

2008 ◽  
Vol 104 (12) ◽  
pp. 124513 ◽  
Author(s):  
P. Gellie ◽  
W. Maineult ◽  
A. Andronico ◽  
G. Leo ◽  
C. Sirtori ◽  
...  

1992 ◽  
Vol 70 (2-3) ◽  
pp. 173-178 ◽  
Author(s):  
Ioanna Diamandi ◽  
Costas Mertzianidis ◽  
John N. Sahalos

The far-field pattern characteristics of line sources lying between the slabs of a four-dielectric substrate configuration are presented. The patterns are calculated for several cases of the substrate thickness as well as for several line-source locations. The considerations that are made give useful applications in remote sensing and microstrip antennas.


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