Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography

Author(s):  
Yusuke Teramoto ◽  
Hiroto Sato ◽  
Kazunori Bessho ◽  
Koji Miyauchi ◽  
Mitsuru Ikeuchi ◽  
...  
2011 ◽  
Vol 75 (1) ◽  
pp. 64-66 ◽  
Author(s):  
A. V. Vodopyanov ◽  
S. V. Golubev ◽  
D. A. Mansfeld ◽  
N. N. Salashchenko ◽  
N. I. Chkhalo

1991 ◽  
Vol 62 (7) ◽  
pp. 1721-1726 ◽  
Author(s):  
K.‐I. Oyama ◽  
K. Suzuki ◽  
N. Kawashima ◽  
K. S. Zalpuri ◽  
S. Teii ◽  
...  

2019 ◽  
Vol 89 (11) ◽  
pp. 1656
Author(s):  
А.Н. Нечай ◽  
А.А. Перекалов ◽  
Н.И. Чхало ◽  
Н.Н. Салащенко

The paper presents the results of studies of a gas-jet laser-plasma source of extreme ultraviolet radiation (EUV) based on a conical supersonic nozzle. Molecular cluster CO2 jets were used as targets. By changing the parameters of the gas at the nozzle entrance, various modes of gas outflow were obtained, the influence of these modes on the emission and technical characteristics of the radiation source was studied. An experimentally shown is an increase in EUV emission with an increase in the amount of clustered matter in the jet. A possible relationship was observed between the increase in the intensity of EUV radiation with an increase in the number of clustered matter in the jet.


1999 ◽  
Vol 38 (25) ◽  
pp. 5413 ◽  
Author(s):  
Klaus Bergmann ◽  
Guido Schriever ◽  
Oliver Rosier ◽  
Martin Müller ◽  
Willi Neff ◽  
...  

2014 ◽  
Vol 1 (3) ◽  
pp. 031008 ◽  
Author(s):  
Michael Zürch ◽  
Stefan Foertsch ◽  
Mark Matzas ◽  
Katharina Pachmann ◽  
Rainer Kuth ◽  
...  

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