A novel photoacid generator for chemically amplified photoresist with ArF exposure

Author(s):  
Toshikage Asakura ◽  
Hitoshi Yamato ◽  
Akira Matsumoto ◽  
Peter Murer ◽  
Masaki Ohwa
2014 ◽  
Vol 43 (6) ◽  
pp. 392-400 ◽  
Author(s):  
S. A. Bulgakova ◽  
D. A. Gurova ◽  
S. D. Zaitsev ◽  
E. E. Kulikov ◽  
E. V. Skorokhodov ◽  
...  

2018 ◽  
Vol 6 (27) ◽  
pp. 7267-7273 ◽  
Author(s):  
Roberto Fallica ◽  
Yasin Ekinci

The rate of photoacid generation is measured experimentally and it is demonstrated to depend on the interaction between polymer backbone and photoacid generator. The clearing volume per absorbed photon and per generated photoacid is also calculated and discussed in view of lithographic resolution and roughness.


1994 ◽  
Author(s):  
Leo L. Linehan ◽  
Gary T. Spinillo ◽  
Randolph S. Smith ◽  
Wayne M. Moreau ◽  
Barry C. McCormick ◽  
...  

2007 ◽  
Author(s):  
Dennis Crapse ◽  
Warren W. Flack ◽  
Ha-Ai Nguyen ◽  
Elliott Capsuto ◽  
Craig McEwen

Sign in / Sign up

Export Citation Format

Share Document