Relationship between Sensitivities of Chemically Amplified Resist Based on Adamantane Derivatives upon Exposure to ArF Excimer Laser, Electron Beam, and Extreme Ultraviolet Radiation

2008 ◽  
Vol 1 ◽  
pp. 067001 ◽  
Author(s):  
Kikuo Furukawa ◽  
Takahiro Kozawa ◽  
Shu Seki ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
Ultraviolet Radiation ◽  
Excimer Laser ◽  
Extreme Ultraviolet ◽  
Adamantane Derivatives ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Arf Excimer Laser ◽  
Extreme Ultraviolet Radiation

Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation

2011 ◽  
Vol 50 (1R) ◽  
pp. 016504 ◽  
Author(s):  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Ryuji Ohnishi ◽  
Takafumi Endo ◽  
Rikimaru Sakamoto
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Extreme Ultraviolet Radiation

Dynamics of Radical Cation of Poly(styrene acrylate)-Based Chemically Amplified Resist for Extreme Ultraviolet and Electron Beam Lithography

2011 ◽  
Vol 50 (6S) ◽  
pp. 06GD03 ◽  
Author(s):  
Yasuharu Tajima ◽  
Kazumasa Okamoto ◽  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Ryoko Fujiyoshi ◽  
...  
Keyword(s):  
Electron Beam ◽  
Radical Cation ◽  
Electron Beam Lithography ◽  
Extreme Ultraviolet ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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