Theoretical Study on Chemical Gradient Generated in Chemically Amplified Resists Based on Polymer Deprotection upon Exposure to Extreme Ultraviolet Radiation

Applied Physics Express ◽

10.1143/apex.2.056503 ◽

2009 ◽

Vol 2 ◽

pp. 056503 ◽

Author(s):

Takahiro Kozawa ◽

Seiichi Tagawa

Keyword(s):

Ultraviolet Radiation ◽

Theoretical Study ◽

Extreme Ultraviolet ◽

Chemical Gradient ◽

Chemically Amplified ◽

Extreme Ultraviolet Radiation ◽

Chemically Amplified Resists

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Image Formation in Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.22.51 ◽

2009 ◽

Vol 22 (1) ◽

pp. 51-58 ◽

Author(s):

Takahiro Kozawa ◽

Seiichi Tagawa

Keyword(s):

Ultraviolet Radiation ◽

Extreme Ultraviolet ◽

Image Formation ◽

Chemically Amplified ◽

Extreme Ultraviolet Radiation ◽

Chemically Amplified Resists

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Difference between Acid Generation Mechanisms in Poly(hydroxystyrene)- and Polyacrylate-Based Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.7125 ◽

2008 ◽

Vol 47 (9) ◽

pp. 7125-7127 ◽

Author(s):

Ryo Hirose ◽

Takahiro Kozawa ◽

Seiichi Tagawa ◽

Daisuke Shimizu ◽

Toshiyuki Kai ◽

...

Keyword(s):

Ultraviolet Radiation ◽

Extreme Ultraviolet ◽

Acid Generation ◽

Chemically Amplified ◽

Extreme Ultraviolet Radiation ◽

Generation Mechanisms ◽

Chemically Amplified Resists

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Dissolution kinetics and deprotection reaction in chemically amplified resists upon exposure to extreme ultraviolet radiation

10.1117/12.814066 ◽

2009 ◽

Author(s):

Hiroki Yamamoto ◽

Takahiro Kozawa ◽

Seiichi Tagawa ◽

Takeyoshi Mimura ◽

Takeshi Iwai ◽

...

Keyword(s):

Ultraviolet Radiation ◽

Extreme Ultraviolet ◽

Dissolution Kinetics ◽

Chemically Amplified ◽

Extreme Ultraviolet Radiation ◽

Chemically Amplified Resists

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Acid Quantum Efficiency of Anion-bound Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.28.501 ◽

2015 ◽

Vol 28 (4) ◽

pp. 501-505

Author(s):

Yoshitaka Komuro ◽

Daisuke Kawana ◽

Taku Hirayama ◽

Katsumi Ohmori ◽

Takahiro Kozawa

Keyword(s):

Ultraviolet Radiation ◽

Quantum Efficiency ◽

Extreme Ultraviolet ◽

Chemically Amplified ◽

Extreme Ultraviolet Radiation ◽

Chemically Amplified Resists

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Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation

Japanese Journal of Applied Physics ◽

10.1143/jjap.48.056508 ◽

2009 ◽

Vol 48 (5) ◽

pp. 056508 ◽

Author(s):

Takahiro Kozawa ◽

Kazumasa Okamoto ◽

Akinori Saeki ◽

Seiichi Tagawa

Keyword(s):

Electron Beam ◽

Ultraviolet Radiation ◽

Extreme Ultraviolet ◽

Chemically Amplified ◽

Extreme Ultraviolet Radiation ◽

Chemically Amplified Resists

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Theoretical Study on Acid Diffusion Length in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.016501 ◽

2013 ◽

Vol 52 (1R) ◽

pp. 016501 ◽

Author(s):

Takahiro Kozawa

Keyword(s):

Theoretical Study ◽

Diffusion Length ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Acid Diffusion ◽

Chemically Amplified ◽

Chemically Amplified Resists

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Theoretical Study of Exposure Latitude of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.106502 ◽

2011 ◽

Vol 50 (10R) ◽

pp. 106502 ◽

Author(s):

Takahiro Kozawa ◽

Seiichi Tagawa

Keyword(s):

Theoretical Study ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Chemically Amplified Resists

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Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.016504 ◽

2011 ◽

Vol 50 ◽

pp. 016504 ◽

Author(s):

Takahiro Kozawa ◽

Seiichi Tagawa ◽

Ryuji Ohnishi ◽

Takafumi Endo ◽

Rikimaru Sakamoto

Keyword(s):

Ultraviolet Radiation ◽

Extreme Ultraviolet ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

Extreme Ultraviolet Radiation

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Relationship between Sensitivities of Chemically Amplified Resist Based on Adamantane Derivatives upon Exposure to ArF Excimer Laser, Electron Beam, and Extreme Ultraviolet Radiation

Applied Physics Express ◽

10.1143/apex.1.067001 ◽

2008 ◽

Vol 1 ◽

pp. 067001 ◽

Author(s):

Kikuo Furukawa ◽

Takahiro Kozawa ◽

Shu Seki ◽

Seiichi Tagawa

Keyword(s):

Electron Beam ◽

Ultraviolet Radiation ◽

Excimer Laser ◽

Extreme Ultraviolet ◽

Adamantane Derivatives ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

Arf Excimer Laser ◽

Extreme Ultraviolet Radiation

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Theoretical Study of Exposure Latitude of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.106502 ◽

2011 ◽

Vol 50 (10) ◽

pp. 106502 ◽

Author(s):

Takahiro Kozawa ◽

Seiichi Tagawa

Keyword(s):

Theoretical Study ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Chemically Amplified Resists

Download Full-text