Effect of Oxygen Impurity on Microstructure and Boron Penetration in a BF 2 + Implanted LPCVD Stacked Amorphous Silicon p+ Gated PMOS Capacitor
1995 ◽
Vol 142
(7)
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pp. 2434-2437
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2008 ◽
Vol 354
(19-25)
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pp. 2126-2130
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1971 ◽
Vol 23
(185)
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pp. 1053-1060
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Keyword(s):
1977 ◽
Vol 24
(2)
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pp. 307-311
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Keyword(s):
2004 ◽
Vol 40
(4)
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pp. 2781-2783
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