Scanning Tunneling Microscopy Study of the Multi-Step Deposited and Annealed HfSiOx Gate Dielectric
2011 ◽
Vol 158
(10)
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pp. H1021
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1993 ◽
Vol 22
(1-4)
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pp. 85-87
2013 ◽
Vol 138
(19)
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pp. 194707
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