Scanning Tunneling Microscopy Study of the Multi-Step Deposited and Annealed HfSiOx Gate Dielectric

2011 ◽  
Vol 158 (10) ◽  
pp. H1021 ◽  
Author(s):  
K. S. Yew ◽  
D. S. Ang ◽  
L. J. Tang ◽  
K. Cui ◽  
G. Bersuker ◽  
...  
Langmuir ◽  
2009 ◽  
Vol 25 (23) ◽  
pp. 13606-13613 ◽  
Author(s):  
Florian Mögele ◽  
Donato Fantauzzi ◽  
Ulf Wiedwald ◽  
Paul Ziemann ◽  
Bernhard Rieger

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