Enhancing Light Output Power of InGaN-Based Light-Emitting Diodes with an Embedded Self-Textured Oxide Mask Structure

2011 ◽  
Vol 158 (12) ◽  
pp. H1242 ◽  
Author(s):  
Wen-Yu Lin ◽  
Kun-Ching Shen ◽  
Ray-Hua Horng ◽  
Dong-Sing Wuu
2009 ◽  
Vol 30 (11) ◽  
pp. 1152-1154 ◽  
Author(s):  
Hung-Wen Huang ◽  
Chung-Hsiang Lin ◽  
Zhi-Kai Huang ◽  
Kang-Yuan Lee ◽  
Chang-Chin Yu ◽  
...  

2011 ◽  
Vol 1342 ◽  
Author(s):  
Atsushi Nishikawa ◽  
Naoki Furukawa ◽  
Dong-gun Lee ◽  
Kosuke Kawabata ◽  
Takanori Matsuno ◽  
...  

ABSTRACTWe investigated the electroluminescence (EL) properties of Eu-doped GaN-based light-emitting diodes (LEDs) grown by organometallic vapor phase epitaxy (OMVPE). The thickness of the active layer was varied to increase the light output power. With increasing the active layer thickness, the light output power monotonically increased. The maximum light output power of 50 μW was obtained for an active layer thickness of 900 nm with an injected current of 20 mA, which is the highest value ever reported. The corresponding external quantum efficiency was 0.12%. The applied voltage for the LED operation also increased with the active layer thickness due to an increase in the resistance of the LED. Therefore, in terms of power efficiency, the optimized active layer thickness was around 600 nm. These results indicate that the optimization of the LED structure would effectively improve the luminescence properties.


2015 ◽  
Vol 15 (4) ◽  
pp. 454-461 ◽  
Author(s):  
Mumta Hena Mustary ◽  
Beo Deul Ryu ◽  
Min Han ◽  
Jong Han Yang ◽  
Volodymyr V. Lysak ◽  
...  

2009 ◽  
Author(s):  
J. K. Huang ◽  
H. W. Huang ◽  
C. H. Lin ◽  
K. Y. Lee ◽  
C. C. Yu ◽  
...  

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