Basic Studies of Multi-Layer Thin Film Analysis Using Fundamental Parameter Method

1989 ◽  
Vol 33 ◽  
pp. 213-223
Author(s):  
Y. Kataoka ◽  
T. Arai

X-ray fluorescence analysis is the most suitable method, for the characterization of the thickness and the chemical composition of thin film samples. It is non-destructive, rapid, precise, and accurate for both metal and oxide samples.

1985 ◽  
Vol 29 ◽  
pp. 395-402 ◽  
Author(s):  
T. C. Huang ◽  
W. Parrish

AbstractThe characterization of multi-layer thin films by X-ray fluorescence using the fundamental parameter method and the LAMA-III program is described. Analyses of a double-layer FeMn/NiFe and two triple-layer NiFe/Cu/Cr and Cr/Cu/NiFe specimens show that the complex inter-layer absorption and secondary fluorescence effects were properly corrected. The compositions and thicknesses of all layers agreed to ±2% with corresponding single-layer films, a precisian comparable with bulk and single-layer thin film analyses.


1989 ◽  
Vol 33 ◽  
pp. 225-235
Author(s):  
Y. Kataoka ◽  
T. Arai

The fundamental parameter method for x-ray spectrometry has been used most commonly for bulk samples, because it permits an analysis utilizing a minimum number of standards, even for samples with complicated matrices. The need for the analysis of thin film materials, which includes multi-layer films, has been increasing in recent years along with the rapid progress of high technologies. However, there have been few reports that deal with the application of fundamental parameter methods to multi-layer thin films. There may be two situations in the analysis of thin films. In routine analysis of quality control applications, they usually require precise analysis. Fortunately, it is possible to prepare well characterized standards similar to the unknowns.


2005 ◽  
Vol 20 (2) ◽  
pp. 183-183
Author(s):  
Y. Kataoka ◽  
N. Kawahara ◽  
S. Hara ◽  
Y. Yamada ◽  
T. Matsuo ◽  
...  

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