A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator

2009 ◽  
Vol 38 (11) ◽  
pp. 1048-1049 ◽  
Author(s):  
Yuta Saito ◽  
Kazuya Matsumoto ◽  
Tomoya Higashihara ◽  
Mitsuru Ueda
Keyword(s):  
Negative Type ◽  
Chemically Amplified ◽  
Ether Ketone ◽  
Photoacid Generator

scholarly journals Negative-type Chemically Amplified Photosensitive Novolac

2008 ◽  
Vol 21 (1) ◽  
pp. 161-164 ◽  
Author(s):  
Yuta Saito ◽  
katsuhisa Mizoguchi ◽  
Mitsuru Ueda
Keyword(s):  
Negative Type ◽  
Chemically Amplified

Photoacid generator–polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography

2018 ◽  
Vol 6 (27) ◽  
pp. 7267-7273 ◽  
Author(s):  
Roberto Fallica ◽  
Yasin Ekinci
Keyword(s):  
Quantum Yield ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Polymer Backbone ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Photoacid Generator ◽  
Polymer Interaction

The rate of photoacid generation is measured experimentally and it is demonstrated to depend on the interaction between polymer backbone and photoacid generator. The clearing volume per absorbed photon and per generated photoacid is also calculated and discussed in view of lithographic resolution and roughness.

Effect of polymer matrix and photoacid generator on the lithographic properties of chemically amplified photoresist

2014 ◽  
Vol 43 (6) ◽  
pp. 392-400 ◽  
Author(s):  
S. A. Bulgakova ◽  
D. A. Gurova ◽  
S. D. Zaitsev ◽  
E. E. Kulikov ◽  
E. V. Skorokhodov ◽  
...  
Keyword(s):  
Polymer Matrix ◽  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Photoacid Generator
Sign in / Sign up

Export Citation Format

Share Document