Negative-type Chemically Amplified Photosensitive Novolac

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.21.161 ◽

2008 ◽

Vol 21 (1) ◽

pp. 161-164 ◽

Author(s):

Yuta Saito ◽

katsuhisa Mizoguchi ◽

Mitsuru Ueda

Keyword(s):

Negative Type ◽

Chemically Amplified

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Negative-type Chemically Amplified Photosensitive Semi-alicyclic Polybenzoxazole via Acid-catalyzed Electrophilic Substitution

Polymer Journal ◽

10.1295/polymj.37.74 ◽

2005 ◽

Vol 37 (2) ◽

pp. 74-81 ◽

Author(s):

Ken-ichi Fukukawa ◽

Yuji Shibasaki ◽

Mitsuru Ueda

Keyword(s):

Electrophilic Substitution ◽

Negative Type ◽

Chemically Amplified ◽

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Negative-type chemically amplified resists for ArF excimer laser lithography

10.1117/12.312364 ◽

1998 ◽

Author(s):

Takuya Naito ◽

Makoto Takahashi ◽

Takeshi Ohfuji ◽

Masaru Sasago

Keyword(s):

Excimer Laser ◽

Negative Type ◽

Laser Lithography ◽

Chemically Amplified ◽

Arf Excimer Laser ◽

Chemically Amplified Resists

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A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator

Chemistry Letters ◽

10.1246/cl.2009.1048 ◽

2009 ◽

Vol 38 (11) ◽

pp. 1048-1049 ◽

Author(s):

Yuta Saito ◽

Kazuya Matsumoto ◽

Tomoya Higashihara ◽

Mitsuru Ueda

Keyword(s):

Negative Type ◽

Chemically Amplified ◽

Ether Ketone ◽

Photoacid Generator

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Stochastic Simulation of Pattern Formation for Negative-Type Chemically Amplified Resists in Extreme Ultraviolet Lithography

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.33.53 ◽

2020 ◽

Vol 33 (1) ◽

pp. 53-56

Author(s):

Masaaki Yasuda ◽

Masanori Koyama ◽

Kyohei Imai ◽

Masamitsu Shirai ◽

Hiroaki Kawata ◽

...

Keyword(s):

Pattern Formation ◽

Stochastic Simulation ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Negative Type ◽

Chemically Amplified ◽

Chemically Amplified Resists

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An Alkaline-Developable, Chemically Amplified, Negative-Type Photosensitive Poly(benzoxazole) Resist Based on Poly(o-hydroxy amide), an Active Ester-Type Cross-Linker, and a Photobase Generator

Macromolecules ◽

10.1021/ma802349b ◽

2009 ◽

Vol 42 (4) ◽

pp. 1024-1030 ◽

Author(s):

Katsuhisa Mizoguchi ◽

Tomoya Higashihara ◽

Mitsuru Ueda

Keyword(s):

Negative Type ◽

Chemically Amplified ◽

Active Ester ◽

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Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator

Journal of Applied Polymer Science ◽

10.1002/app.30358 ◽

2009 ◽

Vol 113 (6) ◽

pp. 3605-3611 ◽

Author(s):

Yuta Saito ◽

Katsuhisa Mizoguchi ◽

Tomoya Higashihara ◽

Mitsuru Ueda

Keyword(s):

Negative Type ◽

Chemically Amplified ◽

Photoacid Generator

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A Korean Patient With Fulminant Autoantibody-Negative Type 1 Diabetes

Diabetes Care ◽

10.2337/diacare.27.12.3023 ◽

2004 ◽

Vol 27 (12) ◽

pp. 3023-3024 ◽

Author(s):

T. S. Jung ◽

S. I. Chung ◽

M. A. Kim ◽

S. J. Kim ◽

M. H. Park ◽

...

Keyword(s):

Type 1 Diabetes ◽

Korean Patient ◽

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Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

Japanese Journal of Applied Physics ◽

10.35848/1347-4065/aba7d7 ◽

2020 ◽

Vol 59 (8) ◽

pp. 086506

Author(s):

Yuta Ikari ◽

Kazumasa Okamoto ◽

Akihiro Konda ◽

Takahiro Kozawa ◽

Takao Tamura

Keyword(s):

Radiation Chemistry ◽

Heating Effect ◽

Chemically Amplified ◽

Chemically Amplified Resists

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Chemically amplified resist technology for i-line applications

10.1117/12.312371 ◽

1998 ◽

Author(s):

Medhat A. Toukhy ◽

Sanjay Malik ◽

Andrew J. Blakeney ◽

Karin R. Schlicht

Keyword(s):

Chemically Amplified ◽

Chemically Amplified Resist

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The relationship between critical dimension shift and diffusion in negative chemically amplified resist systems

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585345 ◽

1991 ◽

Vol 9 (6) ◽

pp. 3380 ◽

Author(s):

Theodore H. Fedynyshyn

Keyword(s):

Critical Dimension ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

The Relationship ◽

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