Grouping design method dependence on illumination system and large off-axis distance for an anamorphic extreme ultraviolet lithography objective

2022 ◽  
Author(s):  
Xu Yan ◽  
Yanqiu Li ◽  
lihui liu ◽  
Ke Liu
Keyword(s):  
Extreme Ultraviolet ◽  
Design Method ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Illumination System

Fabrication of a fly-eye mirror for an extreme-ultraviolet lithography illumination system

2001 ◽  
Author(s):  
Hideo Takino ◽  
Teruki Kobayashi ◽  
Norio Shibata ◽  
Masaaki Kuki ◽  
Akinori Itoh ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Illumination System ◽  
Fly Eye

Illumination system design for a three-aspherical-mirror projection camera for extreme-ultraviolet lithography

2000 ◽  
Vol 39 (19) ◽  
pp. 3253
Author(s):  
Yanqiu Li ◽  
Hiroo Kinoshita ◽  
Takeo Watanabe ◽  
Shigeo Irie ◽  
Shigeru Shirayone ◽  
...  
Keyword(s):  
System Design ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Illumination System ◽  
Aspherical Mirror
Sign in / Sign up

Export Citation Format

Share Document