ScienceGate
Advanced Search
Author Search
Journal Finder
Blog
Sign in / Sign up
ScienceGate
Search
Author Search
Journal Finder
Blog
Sign in / Sign up
Manufacture of fly-eye mirror in an extreme-ultraviolet lithography illumination system by means of ultraprecision diamond cutting
Mapping Intimacies
◽
10.1117/12.472341
◽
2002
◽
Cited By ~ 1
Author(s):
Yoshinori Hashimoto
◽
Yoshimi Takeuchi
◽
Tomohiko Kawai
◽
Kiyoshi Sawada
◽
Hideo Takino
◽
...
Keyword(s):
Extreme Ultraviolet
◽
Extreme Ultraviolet Lithography
◽
Diamond Cutting
◽
Ultraviolet Lithography
◽
Illumination System
◽
Fly Eye
Download Full-text
Related Documents
Cited By
References
Fabrication of a fly-eye mirror for an extreme-ultraviolet lithography illumination system
10.1117/12.436700
◽
2001
◽
Cited By ~ 1
Author(s):
Hideo Takino
◽
Teruki Kobayashi
◽
Norio Shibata
◽
Masaaki Kuki
◽
Akinori Itoh
◽
...
Keyword(s):
Extreme Ultraviolet
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
Illumination System
◽
Fly Eye
Download Full-text
Fabrication of a fly-eye mirror for an extreme-ultraviolet lithography illumination system by arranging silicon mirror elements
10.1117/12.472340
◽
2002
◽
Author(s):
Hideo Takino
◽
Teruki Kobayashi
◽
Kazushi Nomura
◽
Masaaki Kuki
◽
Akinori Itoh
◽
...
Keyword(s):
Extreme Ultraviolet
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
Illumination System
◽
Fly Eye
Download Full-text
Fabrication of a complex-shaped mirror for an extreme ultraviolet lithography illumination system
Optical Engineering
◽
10.1117/1.1591797
◽
2003
◽
Vol 42
(9)
◽
pp. 2676
◽
Cited By ~ 6
Author(s):
Hideo Takino
Keyword(s):
Extreme Ultraviolet
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
Illumination System
Download Full-text
Design of a high-numerical-aperture extreme ultraviolet lithography illumination system
Applied Optics
◽
10.1364/ao.57.005673
◽
2018
◽
Vol 57
(20)
◽
pp. 5673
◽
Cited By ~ 1
Author(s):
Jiahua Jiang
◽
Yanqiu Li
◽
Shihuan Shen
◽
Shanshan Mao
Keyword(s):
Extreme Ultraviolet
◽
Numerical Aperture
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
High Numerical Aperture
◽
Illumination System
Download Full-text
Illumination system for extreme ultraviolet lithography
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.588278
◽
1995
◽
Vol 13
(6)
◽
pp. 2914
◽
Cited By ~ 7
Author(s):
Tsuneyuki Haga
Keyword(s):
Extreme Ultraviolet
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
Illumination System
Download Full-text
Grouping design method dependence on illumination system and large off-axis distance for an anamorphic extreme ultraviolet lithography objective
Applied Optics
◽
10.1364/ao.446729
◽
2022
◽
Author(s):
Xu Yan
◽
Yanqiu Li
◽
lihui liu
◽
Ke Liu
Keyword(s):
Extreme Ultraviolet
◽
Design Method
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
Illumination System
Download Full-text
Illumination system design for a three-aspherical-mirror projection camera for extreme-ultraviolet lithography
Applied Optics
◽
10.1364/ao.39.003253
◽
2000
◽
Vol 39
(19)
◽
pp. 3253
Author(s):
Yanqiu Li
◽
Hiroo Kinoshita
◽
Takeo Watanabe
◽
Shigeo Irie
◽
Shigeru Shirayone
◽
...
Keyword(s):
System Design
◽
Extreme Ultraviolet
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
Illumination System
◽
Aspherical Mirror
Download Full-text
Design of three-mirror illumination system with free-form fly’s eye for extreme ultraviolet lithography
Applied Optics
◽
10.1364/ao.54.002091
◽
2015
◽
Vol 54
(8)
◽
pp. 2091
◽
Cited By ~ 2
Author(s):
Qiuli Mei
◽
Yanqiu Li
Keyword(s):
Extreme Ultraviolet
◽
Free Form
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
Illumination System
Download Full-text
Illumination system with freeform fly’s eye to generate pixelated pupil prescribed by source-mask optimization in extreme ultraviolet lithography
Optical Engineering
◽
10.1117/1.oe.56.6.065101
◽
2017
◽
Vol 56
(6)
◽
pp. 065101
◽
Cited By ~ 1
Author(s):
Jiahua Jiang
◽
Qiuli Mei
◽
Yanqiu Li
◽
Yan Liu
Keyword(s):
Extreme Ultraviolet
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
Illumination System
Download Full-text
High-power source and illumination system for extreme ultraviolet lithography
10.1117/12.371111
◽
1999
◽
Cited By ~ 5
Author(s):
Glenn D. Kubiak
◽
Luis J. Bernardez II
◽
Kevin D. Krenz
◽
William C. Replogle
◽
William C. Sweatt
◽
...
Keyword(s):
High Power
◽
Extreme Ultraviolet
◽
Power Source
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
Illumination System
Download Full-text
Sign in / Sign up
Close
Export Citation Format
Close
Share Document
Close