Design of a high-numerical-aperture extreme ultraviolet lithography illumination system

Applied Optics ◽

10.1364/ao.57.005673 ◽

2018 ◽

Vol 57 (20) ◽

pp. 5673 ◽

Author(s):

Jiahua Jiang ◽

Yanqiu Li ◽

Shihuan Shen ◽

Shanshan Mao

Keyword(s):

Extreme Ultraviolet ◽

Numerical Aperture ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

High Numerical Aperture ◽

Illumination System

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Fabrication and evaluation of nickel-based high-k mask for high numerical aperture extreme ultraviolet lithography

Extreme Ultraviolet (EUV) Lithography XII ◽

10.1117/12.2586778 ◽

2021 ◽

Author(s):

Dongmin Jeong ◽

Yoon Jong Han ◽

Deuk Gyu Kim ◽

Yunsoo Kim ◽

Jinho Ahn

Keyword(s):

Extreme Ultraviolet ◽

Numerical Aperture ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

High Numerical Aperture ◽

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Phase Shift Mask to Compensate for Mask 3D Effect in High-Numerical-Aperture Extreme Ultraviolet Lithography

Nanoscience and Nanotechnology Letters ◽

10.1166/nnl.2016.2249 ◽

2016 ◽

Vol 8 (9) ◽

pp. 729-733 ◽

Author(s):

Yong Ju Jang ◽

Jung Sik Kim ◽

Seongchul Hong ◽

Jinho Ahn

Keyword(s):

Phase Shift ◽

Extreme Ultraviolet ◽

Numerical Aperture ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

High Numerical Aperture ◽

3D Effect ◽

Phase Shift Mask

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Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

Infrared and Laser Engineering ◽

10.3788/irla201948.0814002 ◽

2019 ◽

Vol 48 (8) ◽

pp. 814002

Author(s):

毛姗姗 Mao Shanshan ◽

李艳秋 Li Yanqiu ◽

刘克 Liu Ke ◽

刘丽辉 Liu Lihui ◽

郑猛 Zheng Meng ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Optical Design ◽

Numerical Aperture ◽

Extreme Ultraviolet Lithography ◽

Freeform Surfaces ◽

Ultraviolet Lithography ◽

High Numerical Aperture

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Design of High Numerical Aperture Projection Objective for Industrial Extreme Ultraviolet Lithography

Acta Optica Sinica ◽

10.3788/aos201131.0222003 ◽

2011 ◽

Vol 31 (2) ◽

pp. 0222003

Author(s):

刘菲 Liu Fei ◽

李艳秋 Li Yanqiu

Keyword(s):

Extreme Ultraviolet ◽

Numerical Aperture ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

High Numerical Aperture

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Design of anamorphic magnification high-numerical aperture objective for extreme ultraviolet lithography by curvatures combination method

Applied Optics ◽

10.1364/ao.55.004917 ◽

2016 ◽

Vol 55 (18) ◽

pp. 4917 ◽

Author(s):

Yan Liu ◽

Yanqiu Li ◽

Zhen Cao

Keyword(s):

Extreme Ultraviolet ◽

Numerical Aperture ◽

Combination Method ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

High Numerical Aperture

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Ptychography as a wavefront sensor for high-numerical aperture extreme ultraviolet lithography: analysis and limitations

Optical Engineering ◽

10.1117/1.oe.58.4.043102 ◽

2019 ◽

Vol 58 (04) ◽

pp. 1

Author(s):

Priya Dwivedi ◽

Silvania F. Pereira ◽

H. Paul Urbach

Keyword(s):

Extreme Ultraviolet ◽

Numerical Aperture ◽

Wavefront Sensor ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

High Numerical Aperture

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Analysis of line-and-space resist patterns with sub-20 nm half-pitch fabricated using high-numerical-aperture exposure tool of extreme ultraviolet lithography

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.096501 ◽

2016 ◽

Vol 55 (9) ◽

pp. 096501 ◽

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Extreme Ultraviolet ◽

Numerical Aperture ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

High Numerical Aperture ◽

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Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

10.1117/12.2085022 ◽

2015 ◽

Author(s):

Obert Wood ◽

Sudharshanan Raghunathan ◽

Pawitter Mangat ◽

Vicky Philipsen ◽

Vu Luong ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Numerical Aperture ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

High Numerical Aperture ◽

Alternative Materials

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Fabrication of a complex-shaped mirror for an extreme ultraviolet lithography illumination system

Optical Engineering ◽

10.1117/1.1591797 ◽

2003 ◽

Vol 42 (9) ◽

pp. 2676 ◽

Author(s):

Hideo Takino

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Illumination System

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Manufacture of fly-eye mirror in an extreme-ultraviolet lithography illumination system by means of ultraprecision diamond cutting

10.1117/12.472341 ◽

2002 ◽

Author(s):

Yoshinori Hashimoto ◽

Yoshimi Takeuchi ◽

Tomohiko Kawai ◽

Kiyoshi Sawada ◽

Hideo Takino ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Diamond Cutting ◽

Ultraviolet Lithography ◽

Illumination System ◽

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