Al-2.44 Double Patterning

2021 ◽  
Author(s):  
Richard G. Jones ◽  
Christopher K. Ober ◽  
Teruaki Hayakawa ◽  
Christine K. Luscombe ◽  
Natalie Stingelin
Keyword(s):  
Double Patterning

Diffraction-based overlay for spacer patterning and double patterning technology

2011 ◽  
Author(s):  
Byoung Hoon Lee ◽  
JeongSu Park ◽  
Jongsu Lee ◽  
Sarohan Park ◽  
ChangMoon Lim ◽  
...  
Keyword(s):  
Double Patterning

Advanced aberration control in projection optics for double patterning

2009 ◽  
Author(s):  
Toshiyuki Yoshihara ◽  
Takashi Sukegawa ◽  
Nobuhiko Yabu ◽  
Masatoshi Kobayashi ◽  
Tadashi Arai ◽  
...  
Keyword(s):  
Double Patterning ◽  
Projection Optics

A lithographic and process assessment of photoresist stabilization for double-patterning using 172-nm photoresist curing

2008 ◽  
Author(s):  
Nikolaos Bekiaris ◽  
Hiram Cervera ◽  
Junyan Dai ◽  
Ryoung-han Kim ◽  
Alden Acheta ◽  
...  
Keyword(s):  
Process Assessment ◽  
Double Patterning

Enabling 35nm double patterning contact imaging using a novel CD shrink process

2008 ◽  
Author(s):  
Yoshiaki Yamada ◽  
Michael M. Crouse ◽  
Shannon Dunn ◽  
Tetsu Kawasaki ◽  
Satoru Shimura ◽  
...  
Keyword(s):  
Double Patterning ◽  
Contact Imaging

Track optimization and control for 32nm node double patterning and beyond

2009 ◽  
Author(s):  
David Laidler ◽  
Craig Rosslee ◽  
Koen D'havé ◽  
Philippe Leray ◽  
Len Tedeschi
Keyword(s):  
Optimization And Control ◽  
Double Patterning ◽  
And Control

XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

2008 ◽  
Author(s):  
Vladimir Fleurov ◽  
Slava Rokitski ◽  
Robert Bergstedt ◽  
Hong Ye ◽  
Kevin O’Brien ◽  
...  
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
Double Patterning

Anti-spacer double patterning

2014 ◽  
Author(s):  
Michael Hyatt ◽  
Karen Huang ◽  
Anton DeVilliers ◽  
Mark Slezak ◽  
Zhi Liu
Keyword(s):  
Double Patterning
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