Resistive Switching Characteristic Improvement in a Single-Walled Carbon Nanotube Random Network Embedded Hydrogen Silsesquioxane Thin Films for Flexible Memristors

In this study, we evaluated the improved memristive switching characteristics of hydrogen silsesquioxane (HSQ) nanocomposites embedded with a single-walled carbon nanotube (SWCNT) random network. A low-temperature solution process was implemented using a flexible memristor device on a polyethylene naphthalate (PEN) substrate. The difference in the resistive switching (RS) behavior due to the presence of the SWCNT random network was analyzed by the current transport mechanism. Such a random network not only improves the RS operation but also facilitates a stable multilevel RS performance. The multiple-resistance states exhibited highly reliable nonvolatile retention properties over 104 s at room temperature (25 °C) and at a high temperature (85 °C), showing the possibility of an analog synaptic weight modulation. Consequently, the gradual weight potentiation/depression was realized through 3 × 102 synaptic stimulation pulses. These findings suggest that the embedded SWCNT random network can improve the synaptic weight modulation characteristics with high stability for an artificial synapse and hence can be used in future neuromorphic circuits.

Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing

In this manuscript, we outline a reliable procedure to manufacture photonic nanostructures from single-crystal diamond (SCD). Photonic nanostructures, in our case SCD nanopillars on thin (<1 μ m) platforms, are highly relevant for nanoscale sensing. The presented top-down procedure includes electron beam lithography (EBL) as well as reactive ion etching (RIE). Our method introduces a novel type of inter-layer, namely silicon, that significantly enhances the adhesion of hydrogen silsesquioxane (HSQ) electron beam resist to SCD and avoids sample charging during EBL. In contrast to previously used adhesion layers, our silicon layer can be removed using a highly-selective RIE step, which is not damaging HSQ mask structures. We thus refine published nanofabrication processes to ease a higher process reliability especially in the light of the advancing commercialization of SCD sensor devices.

Study of Oxidation and Polarization-Dependent Optical Properties of Environmentally Stable Layered GaTe Using a Novel Passivation Approach

Emerging two-dimensional gallium chalcogenides, such as gallium telluride (GaTe), are considered promising layered semiconductors that can serve as vital building blocks towards the implementation of nanodevices in the fields of nanoelectronics, optoelectronics, and quantum photonics. However, oxidation-induced electronic, structural, and optical changes observed in ambient-exposed gallium chalcogenides need to be further investigated and addressed. Herein, we report on the thickness-dependent effect of air exposure on the Raman and photoluminescence (PL) properties of GaTe flakes, with thicknesses spanning in the range of a few layers to 100 nm. We have developed a novel chemical passivation that results in complete encapsulation of the as-exfoliated GaTe flakes in ultrathin hydrogen–silsesquioxane (HSQ) film. A combination of correlation and comparison of Raman and PL studies reveal that the HSQ-capped GaTe flakes are effectively protected from oxidation in air ambient over the studied-period of one year, and thus, preserving their structural and optical characteristics. This contrasts with the behavior of uncapped GaTe, where we observe a significant reduction of the GaTe-related PL (~100×) and Raman (~4×) peak intensities for the few-layered flakes over a period of few days. The time-evolution of the Raman spectra in uncapped GaTe is accompanied by the appearance of two new prominent broad peaks at ~130 cm−1 and ~146 cm−1, which are attributed to the formation of polycrystalline tellurium, due to oxidation of ambient-exposed GaTe. Furthermore, and by leveraging this novel passivation, we were able to explore the optical anisotropy of HSQ-capped GaTe flakes. This is caused by the one-dimensional-like nature of the GaTe layer, as the layer comprises Ga–Ga chains extending along the b-axis direction. In concurrence with high-resolution transmission electron microscopy analysis, polarization-dependent PL spectroscopy was used to identify the b-axis crystal direction in HSQ-capped GaTe flakes with various thicknesses over a range of wavelengths (458 nm–633 nm). Thus, our novel surface-passivation offers a new approach to explore and reveal the physical properties of the layered GaTe, with the potential of fabricating reliable polarization-dependent nanophotonics with structural and optical stability.