double patterning
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High density V-GAA transistor structure array based on self-aligned double patterning

2021 ◽  
Author(s):  
Xingsong Su ◽  
Yunsong Qiu ◽  
Mengkang Yu ◽  
GuangSu Shao ◽  
Hongbo Sun ◽  
...  
Keyword(s):  
High Density ◽  
Transistor Structure ◽  
Double Patterning ◽  
Structure Array

scholarly journals INVESTIGATION OF THE PHOTORESIST PROFILE IN SELF-ALIGNED DOUBLE PATTERNING PROCESS APPLYING MATHEMATICAL MODELING METHOD

2021 ◽  
Author(s):  
Elena Tikhonova ◽  
Yevgeny Gornev
Keyword(s):  
Mathematical Modeling ◽  
Line Width ◽  
Modeling Method ◽  
Etching Process ◽  
New Technique ◽  
Software Environment ◽  
Weak Points ◽  
Environment Simulation ◽  
Double Patterning

This paper describes a method that can improve the photoresist profile irregularity in self-aligned double patterning process using the Prolith software environment simulation. The new technique helps not only to find the weak points in the etching process, but also to improve the line width of the resulting elements.

Self-aligned double patterning process for sub-15nm nanoimprint template fabrication

2021 ◽  
Author(s):  
Yoshinori Kagawa ◽  
Machiko Suenaga ◽  
Hikaru Sasaki ◽  
Koji Murano ◽  
Shunko Magoshi ◽  
...  
Keyword(s):  
Double Patterning

Al-2.44 Double Patterning

2021 ◽  
Author(s):  
Richard G. Jones ◽  
Christopher K. Ober ◽  
Teruaki Hayakawa ◽  
Christine K. Luscombe ◽  
Natalie Stingelin
Keyword(s):  
Double Patterning

Line edge roughness reduction for EUV self-aligned double patterning by surface modification on spin-on-carbon and tone inversion technique

2021 ◽  
Vol 20 (02) ◽  
Author(s):  
Eric Liu ◽  
Katie Lutker-Lee ◽  
Qiaowei Lou ◽  
Ya-Ming Chen ◽  
Angélique Raley ◽  
...  
Keyword(s):  
Surface Modification ◽  
Line Edge Roughness ◽  
Inversion Technique ◽  
Edge Roughness ◽  
Double Patterning

Extreme High Aspect Ratio RDL Patterning with Low Temperature Curable Polyimide using Double Patterning Technology

2021 ◽  
Author(s):  
Atsushi Nakamura ◽  
Takanori Koizumi ◽  
Naoki Sato ◽  
Toshihide Aoshima ◽  
Michihiro Ogawa ◽  
...  
Keyword(s):  
Low Temperature ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Double Patterning

Line edge roughness (LER) reduction strategies for EUV self-aligned double patterning (SADP)

2021 ◽  
Author(s):  
Eric Liu ◽  
Katie Lutker-Lee ◽  
Qiaowei Lou ◽  
Ya-Ming Chen ◽  
Angelique Raley ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
Reduction Strategies ◽  
Double Patterning

A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definition

2021 ◽  
Vol 237 ◽  
pp. 111493
Author(s):  
Andressa Macedo Rosa ◽  
Alessandra Leonhardt ◽  
Laís Oliveira de Souza ◽  
Lucas Petersen Barbosa Lima ◽  
Marcos Vinicius Puydinger dos Santos ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Silicon Nanowire ◽  
Double Patterning ◽  
Focused Ion Beam Milling

Resistivity Impact from Modulated Line-Edge-Roughness with Self-aligned Double Patterning

2020 ◽  
Author(s):  
Dewei Xu ◽  
KuangChung Chuang ◽  
Wayne Zhao ◽  
Keith Donegan ◽  
Seung-Yeop Kook ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
Double Patterning

scholarly journals IMPROVEMENT OF SELF-ALIGNED DOUBLE PATTERNING USING SPIN-ON-CARBON MATERIAL

2020 ◽  
Author(s):  
Elena Tikhonova ◽  
Evgeny Gornev
Keyword(s):  
Direct Current ◽  
Carbon Material ◽  
Extreme Ultraviolet ◽  
Regular Structure ◽  
Initial Profile ◽  
Capacitively Coupled ◽  
Plasma Chamber ◽  
Double Patterning ◽  
Capacitively Coupled Plasma

In this paper the advantages of using self-aligned double patterning in conjunction with extreme ultraviolet photolithography were analyzed, and a promising spin-on-carbon material used as the layer for the original pattern of the structure to be formed was identified. In addition, a method to treat and protect the shape of the initial profile of regular structure lines by using a direct current superposition on a capacitively-coupled plasma chamber was presented.

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