Nonlinear Optical Microscopy for Imaging Patterned Self-Assembled Monolayers
Keyword(s):
AbstractWe have used the inherent surface sensitivity of second harmonic generation (SHG) to develop an instrument for nonlinear optical (NLO) microscopy of surfaces and interfaces. This optical technique is ideal for imaging nanometer thick self-assembled monolayers (SAM's) which have been patterned using photolithographic techniques. In this paper we demonstrate the application of SHG microscopy to patterned SAM's of the noncentrosymmetric molecule calixarene and discuss other potential applications for this new technique.
2018 ◽
Vol 20
(33)
◽
pp. 21590-21597
◽
2009 ◽
Vol 8
(1)
◽
pp. 013011
◽
2002 ◽
Vol 117
(8)
◽
pp. 4016-4021
◽
2005 ◽
Vol 50
(25-26)
◽
pp. 4837-4849
◽