scholarly journals Mass Production and Particle Characterization of Fine Spherical Ag Powder by Gas Combustion-Type Spray Pyrolysis

2018 ◽  
Vol 65 (7) ◽  
pp. 414-418
Author(s):  
Shigehiro ARITA ◽  
Takashi OGIHARA ◽  
Masahiro HARADA ◽  
Yasuhiko FURUKAWA
2017 ◽  
Vol 58 (4) ◽  
pp. 596-599
Author(s):  
Shigehiro Arita ◽  
Takashi Ogihara ◽  
Masahiro Harada ◽  
Yasuhiko Furukawa

Author(s):  
Marylyn Bennett-Lilley ◽  
Thomas T.H. Fu ◽  
David D. Yin ◽  
R. Allen Bowling

Chemical Vapor Deposition (CVD) tungsten metallization is used to increase VLSI device performance due to its low resistivity, and improved reliability over other metallization schemes. Because of its conformal nature as a blanket film, CVD-W has been adapted to multiple levels of metal which increases circuit density. It has been used to fabricate 16 MBIT DRAM technology in a manufacturing environment, and is the metallization for 64 MBIT DRAM technology currently under development. In this work, we investigate some sources of contamination. One possible source of contamination is impurities in the feed tungsten hexafluoride (WF6) gas. Another is particle generation from the various reactor components. Another generation source is homogeneous particle generation of particles from the WF6 gas itself. The purpose of this work is to investigate and analyze CVD-W process-generated particles, and establish a particle characterization methodology.


Author(s):  
Chuanya Cao ◽  
Jilei Xu ◽  
Miao He ◽  
Angel Abusleme ◽  
Mathieu Bongrand ◽  
...  
Keyword(s):  

2005 ◽  
Vol 39 (6) ◽  
pp. 1409-1419 ◽  
Author(s):  
Chul-Un Ro ◽  
HeeJin Hwang ◽  
HyeKyeong Kim ◽  
Youngsin Chun ◽  
René Van Grieken

2007 ◽  
Vol 253 (10) ◽  
pp. 4560-4565 ◽  
Author(s):  
D.S. Todorovsky ◽  
R.V. Todorovska ◽  
M.M. Milanova ◽  
D.G. Kovacheva

2004 ◽  
Vol 85 (2-3) ◽  
pp. 286-293 ◽  
Author(s):  
G.Paruthimal Kalaignan ◽  
Dae Jong Seo ◽  
Seung Bin Park
Keyword(s):  

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