scholarly journals CONTROL OF THE ELECTRON BEAM DEFLECTION SYSTEM OF AN ELECTRON BEAM INSTALLATION

2020 ◽  
Vol 2 (7(76)) ◽  
pp. 21-26
Author(s):  
Volodya Dzharov
Keyword(s):  
Electron Beam ◽  
Beam Deflection ◽  
Transverse Axis ◽  
Deflection System ◽  
Scientific Experiments ◽  
Machined Parts ◽  
Precise Movement ◽  
Beam Movement ◽  
Beam Motion ◽  
Technological Mode

This paper explores patterns of electronic beam movement by controlling the transverse axis of the bundle of the uniform magnetic field generated by the coils of the electronic gun. For electron beam processes, the type of process, the technological mode, the design dimensions of the electronic gun, and the shape of the machined parts determines beam motion. The free and precise movement on random trajectories determines the possible applications of the electron beam process in performing various scientific experiments on material processing.

A Fine-Line nMOS IC for Raster-Scan Control of a 500-MHz Electron-Beam Deflection System

1982 ◽  
Vol 17 (2) ◽  
pp. 367-374 ◽  
Author(s):  
R.J. Bayruns ◽  
P.I. Suciu ◽  
N.C. Wittwer. ◽  
D.L. Fraser ◽  
E.N. Fuls ◽  
...  
Keyword(s):  
Electron Beam ◽  
Beam Deflection ◽  
Fine Line ◽  
Deflection System ◽  
Raster Scan

A fine-line nMOS IC for raster-scan control of a 500-MHz electron-beam deflection system

1982 ◽  
Vol 29 (4) ◽  
pp. 737-744 ◽  
Author(s):  
R.J. Bayruns ◽  
P.I. Suciu ◽  
N.C. Wittwer ◽  
D.L. Fraser ◽  
E.N. Fuls ◽  
...  
Keyword(s):  
Electron Beam ◽  
Beam Deflection ◽  
Fine Line ◽  
Deflection System ◽  
Raster Scan

Fast and accurate electron-beam deflection circuits using two kinds of D-A converters

1981 ◽  
Vol 64 (2) ◽  
pp. 101-107
Author(s):  
Yoshifusa Wada ◽  
Masatoshi Migitaka ◽  
Yasuhide Hisamoto ◽  
Koichiro Mizukami
Keyword(s):  
Electron Beam ◽  
Beam Deflection

Optical beam deflection imaging of the electron beam interaction volume in semiconductors

1993 ◽  
Vol 63 (5) ◽  
pp. 645-647 ◽  
Author(s):  
G. Y. Chang ◽  
R. B. Givens ◽  
J. W. M. Spicer ◽  
R. Osiander ◽  
J. C. Murphy
Keyword(s):  
Electron Beam ◽  
Optical Beam ◽  
Beam Deflection ◽  
Interaction Volume ◽  
Beam Interaction

scholarly journals Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass

2018 ◽  
Vol 143 ◽  
pp. 03006 ◽  
Author(s):  
Aleksey Zenin ◽  
Aleksandr Klimov ◽  
Ilya Bakeev
Keyword(s):  
Electron Beam ◽  
Silica Glass ◽  
Treatment Time ◽  
Plasma Electron ◽  
Automated System ◽  
Beam Deflection ◽  
Electron Beam Treatment ◽  
Conductive Materials ◽  
Pressure Area ◽  
Dimensional Processing

The paper gives overview of the results of using narrow-aperture electron beam generated by a forevacuum plasma electron source as a tool for treatment of electrically non-conductive materials, such as technical glass. Effectiveness of electron beam treatment of non-conductive materials is caused by almost complete neutralization of target charge on the treated surface. Charge neutralization occurs due to ion flow from beam plasma generated while transporting the beam through forevacuum pressure area. The study demonstrates the possibility to control depth and form of milling by changing modes of electron beam treatment. Combined use of electron beam and automated system for beam deflection and sweep makes possible to perform dimensional processing, particularly cutting and milling with complex trajectory. Milling rates were experimentally found depending on treatment time and mode. The suggested method of silica glass treatment represents an alternative for traditional treatment methods.

scholarly journals Beam displacement and blur caused by fast electron beam deflection

2020 ◽  
Vol 211 ◽  
pp. 112925
Author(s):  
Lixin Zhang ◽  
Mathijs W.H. Garming ◽  
Jacob P. Hoogenboom ◽  
Pieter Kruit
Keyword(s):  
Electron Beam ◽  
Fast Electron ◽  
Beam Deflection ◽  
Beam Displacement ◽  
Fast Electron Beam

scholarly journals Modeling Rectangular Cantilevers during Torsion and Deflection for Application to Frictional Force Microscopy

2009 ◽  
Vol 15 (3) ◽  
pp. 259-264
Author(s):  
Victor C. Hayden ◽  
Luc Y. Beaulieu
Keyword(s):  
Frictional Force ◽  
Experimental Analysis ◽  
Optical Beam ◽  
Beam Deflection ◽  
Force Microscopy ◽  
Deflection System ◽  
First Case ◽  
Standard Orientation

AbstractA numerical and experimental analysis of the optical beam deflection system used to monitor microcantilevers subjected to simultaneous deflection and twisting such as in lateral or frictional force microscopy was performed. This study focused on two optical beam deflection orientations where in the first case the optical beam and the detector are at a right angle to the length of the cantilever and the second case, which is the more standard orientation, the optical beam is parallel to the length of the lever. This study finds that it is possible to model the twist and the deflection separately and treat each motion independently. Simulations have shown that the above-mentioned systems are equivalent in accuracy and sensitivity for monitoring the simultaneous twist and deflection of cantilevers.

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