Effects of Annealing on Residual Stress in Ta2O5 Films Deposited by Dual Ion Beam Sputtering
Keyword(s):
Ion Beam
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Dual Ion Beam Sputtering for Chromium Nitride as an Alternative to Electroplated Hexavalent Chromium
2005 ◽
pp. 301-304
Keyword(s):
Ion Beam
◽