scholarly journals Growth of Vertically Aligned Carbon Nanotubes by RF-DC Plasma Chemical Vapor Deposition

10.5772/17258 ◽  
2011 ◽  
Author(s):  
Yasuaki Hayashi ◽  
Hideto Sawada ◽  
Hideyuki Takagi
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Dc Plasma ◽  
Vertically Aligned Carbon Nanotubes ◽  
Plasma Chemical Vapor Deposition ◽  
Aligned Carbon Nanotubes ◽  
Vertically Aligned

Formation of Vertically Aligned Carbon Nanotubes by Dual-RF-Plasma Chemical Vapor Deposition

2001 ◽  
Vol 40 (Part 2, No. 6B) ◽  
pp. L631-L634 ◽  
Author(s):  
Takashi Hirao ◽  
Korekiyo Ito ◽  
Hiroshi Furuta ◽  
Yoke Khin Yap ◽  
Takashi Ikuno ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Rf Plasma ◽  
Plasma Chemical ◽  
Vertically Aligned Carbon Nanotubes ◽  
Plasma Chemical Vapor Deposition ◽  
Aligned Carbon Nanotubes ◽  
Vertically Aligned

Growth of well-aligned carbon nanotubes by RF-DC plasma chemical vapor deposition

2010 ◽  
Vol 518 (13) ◽  
pp. 3506-3508 ◽  
Author(s):  
Yasuaki Hayashi ◽  
Takuya Fukumura ◽  
Kazunori Odani ◽  
Teruaki Matsuba ◽  
Risa Utsunomiya
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Dc Plasma ◽  
Plasma Chemical Vapor Deposition ◽  
Aligned Carbon Nanotubes
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