Raman Spectroscopy Analysis of Free Fatty Acid in Olive Oil

Free fatty acid (FFA) is one of the most critical parameters for evaluating the quality of olive oil. In this paper, we present a simple and rapid Raman spectroscopy method for analyzing free fatty acid in olive oil. First, FFA degradation of carotenoids in olive oil is confirmed by analyzing the relative intensity of characteristic vibrational modes and introducing an intensity decrease factor. Second, it is demonstrated that the relative intensity ratio of the two characteristic vibrational modes at 1525 cm−1 and 1655 cm−1 presents a good and rapid analysis of FFA content in olive oil; the relative intensity ratio decreases linearly with FFA content. In addition, resonance Raman scattering of carotenoid is discussed, showing that a green laser should be utilized to study FFA in olive oil.

Controls of Crystallinity and Surface Roughness of Cu Film in Partially Ionized Beam Deposition

Changes of crystallinity and surface roughness are discussed in terms of the average energy per deposited atom in the partially ionized beam(PIB) deposition. The average energy per deposited atom can be controlled by adjusting the ionization potential, Vi and acceleration potential, Va. The ion beam consists of a Cu ion beam and residual gas ion beam and residual gases as well as Cu particles that were ionized and accelerated to provide the film with energy required for film-growth. The relative contribution of residual gas ions and Cu ions to total average energy per deposited atom was varied with the ionization potential. At fixed ionization potentials of Vi=400 V and Vi=450 V, the average energy per deposited atom was varied in the range of 0 to 120 eV with acceleration potential Va, of 0 to 4 kV. The relative intensity ratio, 1(111)/I(200), of the Cu films increased from 6 to 37 and the root mean square(Rms) surface roughness decreased with an increase in acceleration potential at Vi=400 V. The relative intensity ratio, I(lll)/I(200), of Cu films increased up to Va=2 kV at Vi=2 kV, above which a decrease occurred, and the surface roughness of Cu films increased as a funtion of acceleration potential. The degree of preferred orientation was closely related with the average energy per deposited atom. The change of Rms roughness might be affected by ion flux, particle energy and preferred orientation.