Pulsed and Pulsed Bias Sputtering
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Published By Springer US

9781402075438, 9781461504115

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Sinusoidal Waveform

Pulsed and Pulsed Bias Sputtering ◽

10.1007/978-1-4615-0411-5_5 ◽

2003 ◽

pp. 65-73

Author(s):

Edward V. Barnat ◽

Toh-Ming Lu

Keyword(s):

Sinusoidal Waveform

Conclusion and Future Directions

Pulsed and Pulsed Bias Sputtering ◽

10.1007/978-1-4615-0411-5_9 ◽

2003 ◽

pp. 145-147

Author(s):

Edward V. Barnat ◽

Toh-Ming Lu

Keyword(s):

Future Directions

Application of a Pulsed Waveform to a Target: Pulsed Reactive Sputtering

Pulsed and Pulsed Bias Sputtering ◽

10.1007/978-1-4615-0411-5_7 ◽

2003 ◽

pp. 109-128 ◽

Cited By ~ 1

Author(s):

Edward V. Barnat ◽

Toh-Ming Lu

Keyword(s):

Reactive Sputtering

Plasma Sources used for Sputter Deposition

Pulsed and Pulsed Bias Sputtering ◽

10.1007/978-1-4615-0411-5_3 ◽

2003 ◽

pp. 29-43

Author(s):

Edward V. Barnat ◽

Toh-Ming Lu

Keyword(s):

Sputter Deposition ◽

Plasma Sources

Introduction

Pulsed and Pulsed Bias Sputtering ◽

10.1007/978-1-4615-0411-5_1 ◽

2003 ◽

pp. 1-10

Author(s):

Edward V. Barnat ◽

Toh-Ming Lu

Basic Plasma Phenomenon

Pulsed and Pulsed Bias Sputtering ◽

10.1007/978-1-4615-0411-5_2 ◽

2003 ◽

pp. 11-27

Author(s):

Edward V. Barnat ◽

Toh-Ming Lu

Keyword(s):

Plasma Phenomenon

Applications of a Pulsed Waveform to a Substrate: Pulsed Bias Sputtering

Pulsed and Pulsed Bias Sputtering ◽

10.1007/978-1-4615-0411-5_8 ◽

2003 ◽

pp. 129-144

Author(s):

Edward V. Barnat ◽

Toh-Ming Lu

Response of a Plasma to an Applied Bias

Pulsed and Pulsed Bias Sputtering ◽

10.1007/978-1-4615-0411-5_4 ◽

2003 ◽

pp. 45-63

Author(s):

Edward V. Barnat ◽

Toh-Ming Lu

Keyword(s):

Applied Bias

Pulsed Waveform

Pulsed and Pulsed Bias Sputtering ◽

10.1007/978-1-4615-0411-5_6 ◽

2003 ◽

pp. 75-107

Author(s):

Edward V. Barnat ◽

Toh-Ming Lu