Optical Microlithography XXXIV
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9781510640597, 9781510640603
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Full chip computational lithography for KrF multi-focal imaging (MFI) (Conference Presentation)

2021 ◽  
Author(s):  
Will Conley ◽  
Vince Plachecki ◽  
Stephen Hsu ◽  
Michael Crouse ◽  
Rongkuo Zhao ◽  
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Advanced spectral engineering: a new way of process improvements by laser spectra optimization for optical lithography

2021 ◽  
Author(s):  
Koichi Fujii ◽  
Takahito Kumazaki ◽  
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Toshihiro Oga ◽  
Taku Yamazaki
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Optical Lithography ◽  
Process Improvements

Contour-based model calibration to a minimum number of patterns

2021 ◽  
Author(s):  
Bernd Küchler ◽  
Francois Weisbuch ◽  
Wolfgang Hoppe ◽  
Jirka Schatz ◽  
Martin Bohn ◽  
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Model Calibration ◽  
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Lithography layout classification based on graph convolution network

2021 ◽  
Author(s):  
Junbi Zhang ◽  
Xu Ma ◽  
Shengen Zhang ◽  
Xianqiang Zheng ◽  
Rui Chen ◽  
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