Optical Microlithography XXXIV
Latest Publications

TOTAL DOCUMENTS

34
(FIVE YEARS 34)

H-INDEX

0
(FIVE YEARS 0)

Published By SPIE

9781510640597, 9781510640603
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

scholarly journals Front Matter: Volume 11613

2021 ◽  
Keyword(s):  
Matter Volume

Lithography’s endgame: the last wavelength and Moore’s Law 2.0

2021 ◽  
Author(s):  
Ralph R. Dammel
Keyword(s):  
Moore’S Law ◽  
Moore's Law

Effective data sampling techniques for machine learning OPC in full chip production

2021 ◽  
Author(s):  
Hesham Abdelghany ◽  
Kevin Hooker
Keyword(s):  
Machine Learning ◽  
Sampling Techniques ◽  
Data Sampling

Optimization of accurate resist kernels through convolutional neural network

2021 ◽  
Author(s):  
Yonghwi Kwon ◽  
Youngsoo Shin
Keyword(s):  
Neural Network ◽  
Convolutional Neural Network

Full chip computational lithography for KrF multi-focal imaging (MFI) (Conference Presentation)

2021 ◽  
Author(s):  
Will Conley ◽  
Vince Plachecki ◽  
Stephen Hsu ◽  
Michael Crouse ◽  
Rongkuo Zhao ◽  
...  

New scaling enablers in computational lithography

2021 ◽  
Author(s):  
Kunal N. Taravade

Recent developments and concepts in optical exposure technology

2021 ◽  
Author(s):  
Donis G. Flagello
Keyword(s):  
Recent Developments

Advanced spectral engineering: a new way of process improvements by laser spectra optimization for optical lithography

2021 ◽  
Author(s):  
Koichi Fujii ◽  
Takahito Kumazaki ◽  
Takamitsu Komaki ◽  
Toshihiro Oga ◽  
Taku Yamazaki
Keyword(s):  
Optical Lithography ◽  
Process Improvements

Innovative dual mark design for alignment verification and process monitoring in advanced lithography

2021 ◽  
Author(s):  
Jia Hung Chang ◽  
En Chuan Lio ◽  
Junjin Lin ◽  
Tang Chun Weng ◽  
Bill Lin ◽  
...  
Keyword(s):  
Process Monitoring
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