2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

2020 ◽

Author(s):

Hongying Peng ◽

Jonathan Caruso ◽

Dinesh Balasubra Manian ◽

Shiladitya Chakravorty ◽

Ryan Mickelson ◽

...

Keyword(s):

Process Control ◽

Advanced Process Control

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Effect of Sparse or Asymmetric Sampling on the Estimation of Photolithography Overlay Regression Parameters

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185229 ◽

2020 ◽

Author(s):

Tim Conway

Keyword(s):

Regression Parameters

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PMOS SiGe epitaxial growth process improvement to increase Yield and Throughput

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185259 ◽

2020 ◽

Author(s):

Vikas K Kaushal ◽

Rakesh C Mahadevapuram ◽

Guozhen Yue ◽

Arvind Raviswaran

Keyword(s):

Epitaxial Growth ◽

Process Improvement ◽

Growth Process

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Estimation of Process Time Delay between Chamber Measurements and Optical Emission Spectroscopy : APC: Advanced Process Control

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185298 ◽

2020 ◽

Author(s):

Taikang Ning ◽

C.H. Huang ◽

J.A. Jensen ◽

V. Wong ◽

H. Chan

Keyword(s):

Time Delay ◽

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Process Time ◽

Advanced Process Control ◽

Chamber Measurements

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NextGen Calibration Utility for Tool Setup and Matching in Real-Time Automated Visual Inspection Systems

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185401 ◽

2020 ◽

Author(s):

Chris Edwards ◽

Cody L. Morgan ◽

John Rudolph ◽

Danniel Slinker ◽

Debashis Panda

Keyword(s):

Real Time ◽

Visual Inspection ◽

Automated Visual Inspection ◽

Inspection Systems

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Dimensional Control of Line Gratings by Small Angle X-Ray Scattering: Shape and Roughness Extraction

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185351 ◽

2020 ◽

Author(s):

Jerome Reche ◽

Yoann Blancquaert ◽

Guillaume Freychet ◽

Patrice Gergaud ◽

Maxime Besacier

Keyword(s):

Small Angle ◽

Dimensional Control ◽

X Ray ◽

X Ray Scattering ◽

Ray Scattering

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Polysilicon Fuse Electrical Voiding Mechanism AP/DFM: Advanced Patterning / Design for Manufacturability

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185389 ◽

2020 ◽

Author(s):

Gang Liu ◽

Rommel Relos ◽

Bohumil Janik ◽

Robert Davis ◽

Tracy Myers ◽

...

Keyword(s):

Design For Manufacturability

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Creative Use of Vector Scan for Efficient SRAM Inspection

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185264 ◽

2020 ◽

Author(s):

Oliver D. Patterson ◽

Hsiao-Chi Peng ◽

Haokun Hu ◽

Chih-Chung Huang ◽

Panneer S. Venkatachalam

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Trace Data Analytics with Knowledge Distillation : DM: Big Data Management and Mining

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185292 ◽

2020 ◽

Author(s):

Janghwan Lee ◽

Wei Xiong ◽

Wonhyouk Jang

Keyword(s):

Big Data ◽

Data Management ◽

Data Analytics ◽

Trace Data ◽

Knowledge Distillation

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Output Improvement in High Volume Memory Fabs by Reducing Recipe Qualifications

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185365 ◽

2020 ◽

Author(s):

Chris Keith ◽

Ace Chen ◽

Haim Albalak ◽

Maryam Anvar

Keyword(s):

High Volume

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2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Advanced Process Control (APC) for Selective EPI process in 300mm Fab

Effect of Sparse or Asymmetric Sampling on the Estimation of Photolithography Overlay Regression Parameters

PMOS SiGe epitaxial growth process improvement to increase Yield and Throughput

Estimation of Process Time Delay between Chamber Measurements and Optical Emission Spectroscopy : APC: Advanced Process Control

NextGen Calibration Utility for Tool Setup and Matching in Real-Time Automated Visual Inspection Systems

Dimensional Control of Line Gratings by Small Angle X-Ray Scattering: Shape and Roughness Extraction

Polysilicon Fuse Electrical Voiding Mechanism AP/DFM: Advanced Patterning / Design for Manufacturability

Creative Use of Vector Scan for Efficient SRAM Inspection

Trace Data Analytics with Knowledge Distillation : DM: Big Data Management and Mining

Output Improvement in High Volume Memory Fabs by Reducing Recipe Qualifications

Export Citation Format

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Advanced Process Control (APC) for Selective EPI process in 300mm Fab

Effect of Sparse or Asymmetric Sampling on the Estimation of Photolithography Overlay Regression Parameters

PMOS SiGe epitaxial growth process improvement to increase Yield and Throughput

Estimation of Process Time Delay between Chamber Measurements and Optical Emission Spectroscopy : APC: Advanced Process Control

NextGen Calibration Utility for Tool Setup and Matching in Real-Time Automated Visual Inspection Systems

Dimensional Control of Line Gratings by Small Angle X-Ray Scattering: Shape and Roughness Extraction

Polysilicon Fuse Electrical Voiding Mechanism AP/DFM: Advanced Patterning / Design for Manufacturability

Creative Use of Vector Scan for Efficient SRAM Inspection

Trace Data Analytics with Knowledge Distillation : DM: Big Data Management and Mining

Output Improvement in High Volume Memory Fabs by Reducing Recipe Qualifications

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
Latest Publications