Extreme Ultraviolet (EUV) Lithography XI
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56
(FIVE YEARS 56)

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Published By SPIE

9781510634138, 9781510634145
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

An application study on the stochastic effect of EUV photons (Conference Presentation)

2020 ◽  
Author(s):  
Jongsu Kim ◽  
Hyekyoung Jue ◽  
Hyungju Ryu ◽  
Sang-Jin Kim ◽  
Joon-Soo Park ◽  
...  
Keyword(s):  
Application Study ◽  
Stochastic Effect

Extending EUV lithography for DRAM applications

2020 ◽  
Author(s):  
Gijsbert Rispens ◽  
Claire Van Lare ◽  
Dorothe Oorschot ◽  
Rik Hoefnagels ◽  
Shih-Hsiang Liu ◽  
...  
Keyword(s):  
Euv Lithography

Defect improvement for an EUV process

2020 ◽  
Author(s):  
Masahiko Harumoto ◽  
Harold W. Stokes ◽  
Shu Hao Chang ◽  
Moeen Ghafoor ◽  
Brian Cardineau ◽  
...  

Progress in EUV resists status towards high-NA EUV lithography

2020 ◽  
Author(s):  
Xiaolong Wang ◽  
Li-Ting Tseng ◽  
Timothee Allenet ◽  
Iacopo Mochi ◽  
Michaela Vockenhuber ◽  
...  
Keyword(s):  
Euv Lithography

Quantitative phase imaging of EUV masks

2020 ◽  
Author(s):  
Ryan H. Miyakawa ◽  
Stuart Sherwin ◽  
Wenhua Zhu ◽  
Markus Benk ◽  
Patrick Naulleau
Keyword(s):  
Phase Imaging ◽  
Quantitative Phase Imaging ◽  
Quantitative Phase
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