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Optical Fabrication and Testing
Latest Publications
TOTAL DOCUMENTS
47
(FIVE YEARS 0)
H-INDEX
3
(FIVE YEARS 0)
Published By OSA
1557527199
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Self-calibrating white-light interferometry techniques for shape measurement
Optical Fabrication and Testing
◽
10.1364/oft.2002.owd9
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2002
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Author(s):
Joanna Schmit
◽
Shawn McDermed
◽
Artur Olszak
Keyword(s):
White Light
◽
Shape Measurement
◽
White Light Interferometry
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Surface figure determination of vibrating optical membrane
Optical Fabrication and Testing
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10.1364/oft.2002.omd5
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2002
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Author(s):
Ted Rogers
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Joe Geary
Keyword(s):
Surface Figure
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Optics for the large binocular telescope
Optical Fabrication and Testing
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10.1364/oft.2002.omd2
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2002
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Author(s):
H. Martin
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R.G. Allen
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J.H. Burge
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L.R. Dettmann
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J.M. Hill
◽
...
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Lightweight mirror technology development for NGST
Optical Fabrication and Testing
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10.1364/oft.2002.omc1
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2002
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Author(s):
H. Philip Stahl
Keyword(s):
Technology Development
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Shaping weak aspheres with MRF
Optical Fabrication and Testing
◽
10.1364/oft.2002.omb5
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2002
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Author(s):
Paul Murphy
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MR finishing of 220mm diameter aspheric lenses with the QED's Q22
Optical Fabrication and Testing
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10.1364/oft.2002.omb2
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2002
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Author(s):
John Johnson
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Gary Ginter
Keyword(s):
Aspheric Lenses
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Intrinsic birefringence in 193nm and 157nm lithography crystalline optics
Optical Fabrication and Testing
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10.1364/oft.2002.otuc3
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2002
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Author(s):
John Burnett
Keyword(s):
Intrinsic Birefringence
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Fabrication and metrology of high NA imaging optics for EUV-lithography
Optical Fabrication and Testing
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10.1364/oft.2002.otuc4
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2002
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Author(s):
Udo Dinger
Keyword(s):
Euv Lithography
◽
Imaging Optics
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Study of laser conditioning process for optical films
Optical Fabrication and Testing
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10.1364/oft.2002.owb3
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2002
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Cited By ~ 1
Author(s):
Ren Huan
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Jiang Xiao-dong
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Huang Zu-xin
◽
Gan Rong-bing
◽
Zhong Wei
Keyword(s):
Laser Conditioning
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Conditioning Process
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Optical Films
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Future requirements on optics for lithography in the sub 100 nm range
Optical Fabrication and Testing
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10.1364/oft.2002.otuc2
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2002
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Author(s):
Reiner Garreis
Keyword(s):
Nm Range
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