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Plasma Processing for VLSI - VLSI Electronics Microstructure Science
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TOTAL DOCUMENTS
22
(FIVE YEARS 0)
H-INDEX
3
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Published By Elsevier
9780122341083
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Plasma-Enhanced Chemical Vapor Deposition of Dielectrics
Plasma Processing for VLSI - VLSI Electronics Microstructure Science
◽
10.1016/b978-0-12-234108-3.50009-1
◽
1984
◽
pp. 69-88
◽
Cited By ~ 1
Author(s):
T.B. Gorczyca
◽
B. Gorowitz
Keyword(s):
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
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Preface
Plasma Processing for VLSI - VLSI Electronics Microstructure Science
◽
10.1016/b978-0-12-234108-3.50005-4
◽
1984
◽
pp. xiii-xiv
Author(s):
DALE M. BROWN
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Copyright page
Plasma Processing for VLSI - VLSI Electronics Microstructure Science
◽
10.1016/b978-0-12-234108-3.50003-0
◽
1984
◽
pp. iv
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Front Matter
Plasma Processing for VLSI - VLSI Electronics Microstructure Science
◽
10.1016/b978-0-12-234108-3.50002-9
◽
1984
◽
pp. iii
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The History of Plasma Processing
Plasma Processing for VLSI - VLSI Electronics Microstructure Science
◽
10.1016/b978-0-12-234108-3.50006-6
◽
1984
◽
pp. 1-24
◽
Cited By ~ 6
Author(s):
DONALD L. TOLLIVER
Keyword(s):
Plasma Processing
◽
History Of
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Basic Principles of Plasma Etching for Silicon Devices
Plasma Processing for VLSI - VLSI Electronics Microstructure Science
◽
10.1016/b978-0-12-234108-3.50013-3
◽
1984
◽
pp. 189-251
◽
Cited By ~ 10
Author(s):
DANIEL L. FLAMM
◽
VINCENT M. DONNELLY
◽
DALE E. IBBOTSON
Keyword(s):
Plasma Etching
◽
Basic Principles
◽
Silicon Devices
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Reactive Ion Etching
Plasma Processing for VLSI - VLSI Electronics Microstructure Science
◽
10.1016/b978-0-12-234108-3.50015-7
◽
1984
◽
pp. 297-339
◽
Cited By ~ 6
Author(s):
BERNARD GOROWITZ
◽
RICHARD J. SAIA
Keyword(s):
Reactive Ion Etching
◽
Ion Etching
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Index
Plasma Processing for VLSI - VLSI Electronics Microstructure Science
◽
10.1016/b978-0-12-234108-3.50021-2
◽
1984
◽
pp. 509-521
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Emerging Etching Techniques
Plasma Processing for VLSI - VLSI Electronics Microstructure Science
◽
10.1016/b978-0-12-234108-3.50019-4
◽
1984
◽
pp. 447-486
◽
Cited By ~ 3
Author(s):
Y. HORIIKE
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High-Pressure Etching
Plasma Processing for VLSI - VLSI Electronics Microstructure Science
◽
10.1016/b978-0-12-234108-3.50014-5
◽
1984
◽
pp. 253-296
◽
Cited By ~ 3
Author(s):
DONALD L. SMITH
Keyword(s):
High Pressure
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