Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)

A 100-kV, 100-A/cm/sup 2/ electron optical system for the EB-X3 X-ray mask writer

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872682 ◽

2002 ◽

Author(s):

K. Saito ◽

J. Kato ◽

T. Matsuda ◽

Y. Nakayama

Keyword(s):

Optical System ◽

Electron Optical System ◽

X Ray

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Capability of 70 nm pattern replication in x-ray lithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872622 ◽

2002 ◽

Author(s):

Y. Kikuchi ◽

M. Hasegawa ◽

T. Iwamoto ◽

K. Fujii ◽

Y. Matsui

Keyword(s):

X Ray

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Fabrication of gated field emitter from wedge array prepared by stamp technology

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872655 ◽

2002 ◽

Author(s):

A. Baba ◽

K. Tsubaki ◽

M. Iwamoto ◽

T. Asano

Keyword(s):

Field Emitter

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Imprinting characteristics by photo-induced solidification of liquid polymer

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872771 ◽

2002 ◽

Author(s):

M. Komuro ◽

J. Taniguchi ◽

Y. Tokano ◽

S. Inoue ◽

N. Kimura ◽

...

Keyword(s):

Liquid Polymer

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Micromachining of optical fiber using reactive ion etching and its application

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872672 ◽

2002 ◽

Cited By ~ 2

Author(s):

H. Kumazaki ◽

Y. Yamada ◽

T. Oshima ◽

S. Inaba ◽

K. Hane

Keyword(s):

Optical Fiber ◽

Reactive Ion Etching ◽

Ion Etching

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Al dot hexagonal array formation using anodic oxidation and selective etching

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872691 ◽

2002 ◽

Author(s):

Y. Murakami ◽

S. Shingubara ◽

H. Sakaue ◽

T. Talahagi

Keyword(s):

Anodic Oxidation ◽

Selective Etching ◽

Hexagonal Array

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Dependence of buffer layer on the distribution of InAs quantum dots

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872690 ◽

2002 ◽

Author(s):

Hyo Jin Kim ◽

Byung Don Min ◽

Young Ju Park ◽

Chan Kyung Hyon ◽

Se Ki Park ◽

...

Keyword(s):

Quantum Dots ◽

Buffer Layer ◽

Inas Quantum Dots

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Current status of EUV optics and future advancements in optical components

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872763 ◽

2002 ◽

Author(s):

D. Sweeney

Keyword(s):

Current Status ◽

Optical Components

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Biochemical IC using micro stereolithography-towards artificial cellular device

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872605 ◽

2002 ◽

Cited By ~ 1

Author(s):

K. Ikuta

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Damage-free flattening technology of large diameter Si wafer employing numerically controlled local SF/sub 6//H/sub 2/ downstream plasma

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872759 ◽

2002 ◽

Author(s):

M. Yanagisawa ◽

H. Ogawa ◽

Y. Horiike

Keyword(s):

Large Diameter ◽

Si Wafer

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Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)
Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

A 100-kV, 100-A/cm/sup 2/ electron optical system for the EB-X3 X-ray mask writer

Capability of 70 nm pattern replication in x-ray lithography

Fabrication of gated field emitter from wedge array prepared by stamp technology

Imprinting characteristics by photo-induced solidification of liquid polymer

Micromachining of optical fiber using reactive ion etching and its application

Al dot hexagonal array formation using anodic oxidation and selective etching

Dependence of buffer layer on the distribution of InAs quantum dots

Current status of EUV optics and future advancements in optical components

Biochemical IC using micro stereolithography-towards artificial cellular device

Damage-free flattening technology of large diameter Si wafer employing numerically controlled local SF/sub 6//H/sub 2/ downstream plasma

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Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

A 100-kV, 100-A/cm/sup 2/ electron optical system for the EB-X3 X-ray mask writer

Capability of 70 nm pattern replication in x-ray lithography

Fabrication of gated field emitter from wedge array prepared by stamp technology

Imprinting characteristics by photo-induced solidification of liquid polymer

Micromachining of optical fiber using reactive ion etching and its application

Al dot hexagonal array formation using anodic oxidation and selective etching

Dependence of buffer layer on the distribution of InAs quantum dots

Current status of EUV optics and future advancements in optical components

Biochemical IC using micro stereolithography-towards artificial cellular device

Damage-free flattening technology of large diameter Si wafer employing numerically controlled local SF/sub 6//H/sub 2/ downstream plasma

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)
Latest Publications