2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
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9781538676011
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AFM Surface Roughness and Depth Measurement of Trenches with High Aspect Ratio

2019 ◽  
Author(s):  
Franz Heider ◽  
Helfried Schwarzfurtner ◽  
Mario Lugger ◽  
Sang-Joon Cho ◽  
Thomas Trenkler
Keyword(s):  
Surface Roughness ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Depth Measurement

Implant Optimization for a 180nm BCD Technology

2019 ◽  
Author(s):  
B. Greenwood ◽  
L. Roszol ◽  
M. Nagy ◽  
G. Molnar ◽  
Z. Kiss ◽  
...  

Yield Learning for Complex FinFET Defect Mechanisms Based on Volume Scan Diagnosis Results

2019 ◽  
Author(s):  
Huaxing Tang ◽  
Manish Sharma ◽  
Wu-Tung Cheng ◽  
Gaurav Veda ◽  
Douglas Gehringer ◽  
...  
Keyword(s):  
Yield Learning

Improved Liquid Source Vaporization for CVD & ALD Precursors

2019 ◽  
Author(s):  
Kathleen Erickson ◽  
Thuc Dinh ◽  
Eric Ellsworth ◽  
Hongxu Duan
Keyword(s):  
Liquid Source

Study of Plasma Arcing Mechanism in High Aspect Ratio Slit Trench Etching

2019 ◽  
Author(s):  
Yao-An Chung ◽  
Cheng-Yi Lung ◽  
Yuan-Chieh Chiu ◽  
Hong-Ji Lee ◽  
Nan-Tzu Lian ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio
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