High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics
Latest Publications

TOTAL DOCUMENTS

12

(FIVE YEARS 0)

H-INDEX

2

(FIVE YEARS 0)

Published By Springer Berlin Heidelberg

9783642365348, 9783642365355

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Lanthanide-Based High-k Gate Dielectric Materials

High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics ◽

10.1007/978-3-642-36535-5_9 ◽

2013 ◽

pp. 343-369 ◽

Author(s):

Daniel J. Lichtenwalner

Keyword(s):

Gate Dielectric ◽

Dielectric Materials ◽

High K ◽

High K Gate Dielectric

Download Full-text

Introduction to High-k Gate Stacks

High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics ◽

10.1007/978-3-642-36535-5_1 ◽

2013 ◽

pp. 1-45

Author(s):

Samares Kar

Keyword(s):

Gate Stacks ◽

Download Full-text

Crystalline Oxides on Silicon

High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics ◽

10.1007/978-3-642-36535-5_11 ◽

2013 ◽

pp. 395-423 ◽

Author(s):

H. Jörg Osten

Keyword(s):

Crystalline Oxides

Download Full-text

V FB /V TH Anomaly in High-k Gate Stacks

High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics ◽

10.1007/978-3-642-36535-5_6 ◽

2013 ◽

pp. 263-282 ◽

Author(s):

Akira Toriumi ◽

Toshihide Nabatame

Keyword(s):

Gate Stacks ◽

Download Full-text

Metal Gate Electrodes

High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics ◽

10.1007/978-3-642-36535-5_5 ◽

2013 ◽

pp. 235-262

Author(s):

Jamie K. Schaeffer

Keyword(s):

Metal Gate Electrodes ◽

Gate Electrodes

Download Full-text

MOSFET: Basics, Characteristics, and Characterization

High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics ◽

10.1007/978-3-642-36535-5_2 ◽

2013 ◽

pp. 47-152 ◽

Author(s):

Samares Kar

Download Full-text

Reliability Implications of Fast and Slow Degradation Processes in High-k Gate Stacks

High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics ◽

10.1007/978-3-642-36535-5_8 ◽

2013 ◽

pp. 309-341 ◽

Author(s):

Gennadi Bersuker

Keyword(s):

Gate Stacks ◽

Degradation Processes ◽

Download Full-text

Channel Mobility

High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics ◽

10.1007/978-3-642-36535-5_7 ◽

2013 ◽

pp. 283-308

Author(s):

Chadwin Young

Keyword(s):

Channel Mobility

Download Full-text

Ternary HfO2 and La2O3 Based High-k Gate Dielectric Films for Advanced CMOS Applications

High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics ◽

10.1007/978-3-642-36535-5_10 ◽

2013 ◽

pp. 371-394 ◽

Author(s):

Akira Toriumi ◽

Koji Kita

Keyword(s):

Gate Dielectric ◽

Dielectric Films ◽

High K ◽

High K Gate Dielectric

Download Full-text

Hf-Based High-k Gate Dielectric Processing

High Permittivity Gate Dielectric Materials - Springer Series in Advanced Microelectronics ◽

10.1007/978-3-642-36535-5_4 ◽

2013 ◽

pp. 183-234

Author(s):

Masaaki Niwa

Keyword(s):

Gate Dielectric ◽

High K ◽

High K Gate Dielectric

Download Full-text