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Optical Microlithography XXXI
Latest Publications
TOTAL DOCUMENTS
53
(FIVE YEARS 0)
H-INDEX
2
(FIVE YEARS 0)
Published By SPIE
9781510616660, 9781510616677
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Latest Documents
Most Cited Documents
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Related Sources
Related Keywords
Front Matter: Volume 10587
Optical Microlithography XXXI
◽
10.1117/12.2324760
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2018
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Keyword(s):
Matter Volume
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Roughness power spectral density as a function of resist parameters and its impact through process
Optical Microlithography XXXI
◽
10.1117/12.2297690
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2018
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Cited By ~ 3
Author(s):
Charlotte Cutler
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James W. Thackeray
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Jason DeSisto
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Choong-Bong Lee
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Mingqi Li
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...
Keyword(s):
Spectral Density
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Power Spectral Density
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Power Spectral
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DUV light source sustainability achievements and next steps
Optical Microlithography XXXI
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10.1117/12.2299387
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2018
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Author(s):
Yzzer Roman
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Theodore Cacouris
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Dinesh Kanawade
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Walt Gillespie
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Siqi Luo
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...
Keyword(s):
Light Source
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A novel method to fast fix the post OPC weak-points through Calibre eqDRC application
Optical Microlithography XXXI
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10.1117/12.2292695
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2018
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Author(s):
YaDong Jin
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ShiZhi Lyu
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Cong Lu
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ZeXi Deng
Keyword(s):
Weak Points
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Novel Method
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Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes
Optical Microlithography XXXI
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10.1117/12.2297316
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2018
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Author(s):
Hirotaka Miyamoto
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Hiroshi Furusato
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Keisuke Ishida
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Hiroaki Tsushima
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Akihiko Kurosu
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...
Keyword(s):
Leading Edge
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Next Generation
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Immersion Lithography
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Laser Technologies
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Arf Laser
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Tunable bandwidth for application-specific SAxP process enhancement
Optical Microlithography XXXI
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10.1117/12.2300511
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2018
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Author(s):
Paolo Alagna
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Serge Biesemans
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Kathleen Nafus
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Gian Francesco Lorusso
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Gregory Rechtsteiner
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...
Keyword(s):
Application Specific
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Advanced light source technologies for memory and logic processes (Conference Presentation)
Optical Microlithography XXXI
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10.1117/12.2298431
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2018
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Author(s):
Theodore Cacouris
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Josh Thornes
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Marc Sells
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Aleks Simic
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Will Conley
Keyword(s):
Light Source
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Advanced Light Source
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Improving 130nm node patterning using inverse lithography techniques for an analog process
Optical Microlithography XXXI
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10.1117/12.2297219
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2018
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Author(s):
Can Duan
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Scott Jessen
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David Ziger
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Mizuki Watanabe
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Steve Prins
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...
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Freeform mask optimization using advanced image based M3D inverse lithography and 3D-NAND full chip opc application
Optical Microlithography XXXI
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10.1117/12.2297397
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2018
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Author(s):
Sam Liu
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Jingjing Liu
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Andy Yang
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Moran Guo
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Jun He
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...
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Cross-platform (NXE-NXT) machine-to-machine overlay matching supporting next node chip manufacturing
Optical Microlithography XXXI
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10.1117/12.2297387
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2018
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Author(s):
Ting-Ju Yueh
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Miao-Chi Chen
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Hsueh-Hung Wu
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Shin-Rung Peng
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Chun-Kuang Chen
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...
Keyword(s):
Machine To Machine
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Cross Platform
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