High-K Gate Dielectric Materials
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Analysis of Interface Charge Density: Application to High-k Material Tantalum Pentoxide

2020 ◽  
pp. 89-113
Author(s):  
N. P. Maity ◽  
Reshmi Maity
Keyword(s):  
Charge Density ◽  
Tantalum Pentoxide ◽  
Interface Charge ◽  
High K

High-k Dielectric Materials: Structural Properties and Selection

2020 ◽  
pp. 31-57
Author(s):  
P. Sri Harsha ◽  
K. Venkata Saravanan ◽  
V. Madhurima
Keyword(s):  
Structural Properties ◽  
Dielectric Materials ◽  
High K ◽  
High K Dielectric

High-k Material Processing in CMOS VLSI Technology

2020 ◽  
pp. 115-181
Author(s):  
Partha Pratim Sahu
Keyword(s):  
Material Processing ◽  
Vlsi Technology ◽  
High K ◽  
Cmos Vlsi

Tunneling Current Density and Tunnel Resistivity: Application to High-k Material HfO2

2020 ◽  
pp. 73-88
Author(s):  
N.P. Maity ◽  
Reshmi Maity
Keyword(s):  
Current Density ◽  
Tunneling Current ◽  
High K

SiO2-Based MOS Devices: Leakage and Limitations

2020 ◽  
pp. 13-29
Author(s):  
N. P. Maity ◽  
Reshmi Maity
Keyword(s):  
Mos Devices

Moore’s Law: In the 21st Century

2020 ◽  
pp. 1-11
Author(s):  
N.P. Maity ◽  
Reshmi Maity
Keyword(s):  
21St Century ◽  
Moore’S Law ◽  
Moore's Law

Tunnel FET: Working, Structure, and Modeling

2020 ◽  
pp. 183-199
Author(s):  
Srimanta Baishya
Keyword(s):  
Tunnel Fet

Selection of High-k Dielectric Materials

2020 ◽  
pp. 59-71
Author(s):  
N.P. Maity ◽  
Reshmi Maity
Keyword(s):  
Dielectric Materials ◽  
High K ◽  
High K Dielectric ◽  
Selection Of
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