Extreme Ultraviolet (EUV) Lithography IX
Latest Publications

TOTAL DOCUMENTS

71
(FIVE YEARS 0)

H-INDEX

4
(FIVE YEARS 0)

Published By SPIE

9781510616585, 9781510616592
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Speckle metrology for extreme ultra-violet lithography

2018 ◽  
Author(s):  
Aamod Shanker ◽  
Patrick Naulleau ◽  
Laura Waller ◽  
G. Gunjala ◽  
A. Wojdyla ◽  
...  
Keyword(s):  
Ultra Violet ◽  
Speckle Metrology

Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W

2018 ◽  
Author(s):  
Igor V. Fomenkov ◽  
Alexander A. Schafgans ◽  
Yezheng Tao ◽  
Robert J. Rafac ◽  
Michael Purvis ◽  
...  
Keyword(s):  
High Volume ◽  
Power Scaling

Illumination source optimization in EUV lithography for staggered contact holes and pillars for DRAM applications (Conference Presentation)

2018 ◽  
Author(s):  
Jo Finders ◽  
Ziyang Wang ◽  
John McNamara ◽  
C.N. Ahn ◽  
Chang-Moon Lim ◽  
...  
Keyword(s):  
Euv Lithography ◽  
Illumination Source

EUV contact-hole local CD uniformity optimization for DRAM storage node application (Conference Presentation)

2018 ◽  
Author(s):  
Mijung Lim ◽  
Chang-Moon Lim ◽  
Chang-Nam Ahn ◽  
Daniel Park ◽  
Anita Fumar-Pici ◽  
...  
Keyword(s):  
Storage Node

EUVL Gen 2.0: Key requirements for constraining semiconductor cost in advanced technology node manufacturing

2018 ◽  
Author(s):  
Arindam Mallik ◽  
Peter Debacker ◽  
Greg McIntyre ◽  
Ryan R. Kim ◽  
Kurt Ronse
Keyword(s):  
Advanced Technology ◽  
Technology Node

CNTs in the context of EUV pellicle history (Conference Presentation)

2018 ◽  
Author(s):  
Emily E. Gallagher ◽  
Marina Y. Timmermans ◽  
Ivan Pollentier ◽  
Jae Uk Lee ◽  
Marina Mariano ◽  
...  

Characterization and control of EUV scanner dose uniformity and stability (Conference Presentation)

2018 ◽  
Author(s):  
Christopher F. Robinson ◽  
Dan Corliss ◽  
Luciana Meli ◽  
Richard Johnson
Keyword(s):  
Dose Uniformity ◽  
And Control

EPE fundamentals and impact of EUV: Will traditional design-rule calculations work in the era of EUV? (Conference Presentation)

2018 ◽  
Author(s):  
Allen H. Gabor ◽  
Andrew Brendler ◽  
Timothy A. Brunner ◽  
Xuemei Chen ◽  
James Culp ◽  
...  
Keyword(s):  
Design Rule ◽  
Traditional Design
Load More ...
Sign in / Sign up

Export Citation Format

Share Document