International Conference on Extreme Ultraviolet Lithography 2017
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60
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Published By SPIE

9781510613744, 9781510613751
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography

2017 ◽  
Author(s):  
Eelco van Setten ◽  
Gerardo Bottiglieri ◽  
Laurens de Winter ◽  
Jan Lubkoll ◽  
John McNamara ◽  
...  
Keyword(s):  
Error Control ◽  
Euv Lithography

Taking a SHARP look at mask 3D effects

2017 ◽  
Author(s):  
Markus P. Benk ◽  
Weilun Chao ◽  
Ryan H. Miyakawa ◽  
Kenneth A. Goldberg ◽  
Patrick P. Naulleau
Keyword(s):  
3D Effects

EUV source optimization driven by fundamental diffraction considerations

2017 ◽  
Author(s):  
Jo Finders ◽  
Par Broman ◽  
Paul van Adrichem ◽  
Erik Wang ◽  
Eelco van Setten ◽  
...  

Wrinkle formation analysis in extreme-ultraviolet pellicle

2017 ◽  
Author(s):  
Hae Nam Jeong ◽  
Guk-Jin Kim ◽  
Sung-Gyu Lee ◽  
Hye-Keun Oh
Keyword(s):  
Extreme Ultraviolet

Classification and printability of EUV mask defects from SEM images

2017 ◽  
Author(s):  
Wonil Cho ◽  
Vikram L. Tolani ◽  
Masaki Satake ◽  
Daniel Price ◽  
Paul A. Morgan ◽  
...  
Keyword(s):  
Sem Images

A study on enhancing EUV resist sensitivity (2)

2017 ◽  
Author(s):  
Atsushi Sekiguchi ◽  
Michiya Naito ◽  
Tetsuo Harada ◽  
Takeo Watanabe ◽  
Yoko Matsumoto ◽  
...  

scholarly journals Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography

2017 ◽  
Author(s):  
Zuhal Tasdemir ◽  
Yasin Ekinci ◽  
Roberto Fallica ◽  
Iacopo Mochi ◽  
Karen Garrido Olvera ◽  
...  
Keyword(s):  
Interference Lithography ◽  
Contrast Matching

scholarly journals Actinic inspection of EUV reticles with arbitrary pattern design

2017 ◽  
Author(s):  
Iacopo Mochi ◽  
Patrick Helfenstein ◽  
Yasin Ekinci ◽  
Dimitrios Kazazis ◽  
Shusuke Yoshitake ◽  
...  
Keyword(s):  
Pattern Design
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