Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography

Author(s):  
Eelco van Setten ◽  
Gerardo Bottiglieri ◽  
Laurens de Winter ◽  
Jan Lubkoll ◽  
John McNamara ◽  
...  
Author(s):  
Serge Prudhomme ◽  
Paul T. Bauman ◽  
J. Tinsley Oden, Professor

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