11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003
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Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

The role of emissivity standards in advanced rtp

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249139 ◽

2005 ◽

Author(s):

R. Bremensdorfer

Why emissivity standards and what characteristics?

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249137 ◽

2005 ◽

Author(s):

J. Gelpey

Emissivity of semiconductor substrate in non-equilibrium environment

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249140 ◽

2005 ◽

Author(s):

B. Lojek

Keyword(s):

Semiconductor Substrate ◽

Non Equilibrium

Why emisspvity standards and what characteristics?

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249141 ◽

2005 ◽

Author(s):

B. Peuse

New directions in thermal batch processing

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249147 ◽

2004 ◽

Author(s):

R. Herring ◽

T. Lazerand ◽

C. Porter

Keyword(s):

Batch Processing ◽

New Directions

Use of optical fiber thermometers in high temperature environments

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249128 ◽

2004 ◽

Author(s):

M.R. Jones ◽

D.G. Barker

Keyword(s):

High Temperature ◽

Optical Fiber

Overview of NIST metrology development for the semiconductor industry

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249121 ◽

2004 ◽

Cited By ~ 1

Author(s):

S. Knight

Keyword(s):

Semiconductor Industry

Flash thermal processing through the melting point of silicon

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249124 ◽

2004 ◽

Author(s):

J.J. Cibere ◽

S.P. McCoy ◽

D. Camm ◽

G.C. Stuart ◽

K. Elliott

Keyword(s):

Melting Point ◽

Thermal Processing

Lightpipe proximity effects on Si wafer temperature in rapid thermal processing tools

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249133 ◽

2004 ◽

Cited By ~ 3

Author(s):

K.G. Kreider ◽

D.H. Chen ◽

D.P. DeWitt ◽

W.A. Kimes ◽

B.K. Tsai

Keyword(s):

Thermal Processing ◽

Rapid Thermal Processing ◽

Proximity Effects ◽

Wafer Temperature ◽

Si Wafer

Heat transfer in product patterned silicon semiconductor substrate

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249126 ◽

2004 ◽

Cited By ~ 1

Author(s):

B. Lojek

Keyword(s):

Heat Transfer ◽

Semiconductor Substrate

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

The role of emissivity standards in advanced rtp

Why emissivity standards and what characteristics?

Emissivity of semiconductor substrate in non-equilibrium environment

Why emisspvity standards and what characteristics?

New directions in thermal batch processing

Use of optical fiber thermometers in high temperature environments

Overview of NIST metrology development for the semiconductor industry

Flash thermal processing through the melting point of silicon

Lightpipe proximity effects on Si wafer temperature in rapid thermal processing tools

Heat transfer in product patterned silicon semiconductor substrate

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003
Latest Publications