11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003
Latest Publications

TOTAL DOCUMENTS

34

(FIVE YEARS 0)

H-INDEX

4

(FIVE YEARS 0)

Published By IEEE

0780378741

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

The role of emissivity standards in advanced rtp

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249139 ◽

2005 ◽

Author(s):

R. Bremensdorfer

Download Full-text

Why emissivity standards and what characteristics?

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249137 ◽

2005 ◽

Author(s):

J. Gelpey

Download Full-text

Emissivity of semiconductor substrate in non-equilibrium environment

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249140 ◽

2005 ◽

Author(s):

B. Lojek

Keyword(s):

Semiconductor Substrate ◽

Non Equilibrium

Download Full-text

Why emisspvity standards and what characteristics?

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249141 ◽

2005 ◽

Author(s):

B. Peuse

Download Full-text

New directions in thermal batch processing

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249147 ◽

2004 ◽

Author(s):

R. Herring ◽

T. Lazerand ◽

C. Porter

Keyword(s):

Batch Processing ◽

Download Full-text

Use of optical fiber thermometers in high temperature environments

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249128 ◽

2004 ◽

Author(s):

M.R. Jones ◽

D.G. Barker

Keyword(s):

High Temperature ◽

Download Full-text

Overview of NIST metrology development for the semiconductor industry

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249121 ◽

2004 ◽

Author(s):

S. Knight

Keyword(s):

Semiconductor Industry

Download Full-text

Flash thermal processing through the melting point of silicon

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249124 ◽

2004 ◽

Author(s):

J.J. Cibere ◽

S.P. McCoy ◽

D. Camm ◽

G.C. Stuart ◽

K. Elliott

Keyword(s):

Melting Point ◽

Thermal Processing

Download Full-text

Heat transfer in product patterned silicon semiconductor substrate

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249126 ◽

2004 ◽

Author(s):

B. Lojek

Keyword(s):

Heat Transfer ◽

Semiconductor Substrate

Download Full-text

Lightpipe proximity effects on Si wafer temperature in rapid thermal processing tools

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 ◽

10.1109/rtp.2003.1249133 ◽

2004 ◽

Author(s):

K.G. Kreider ◽

D.H. Chen ◽

D.P. DeWitt ◽

W.A. Kimes ◽

B.K. Tsai

Keyword(s):

Thermal Processing ◽

Rapid Thermal Processing ◽

Proximity Effects ◽

Wafer Temperature ◽

Download Full-text