Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays
Latest Publications

TOTAL DOCUMENTS

(FIVE YEARS 0)

H-INDEX

(FIVE YEARS 0)

Published By IEEE

0780330560

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Trends in polycrystalline-silicon thin-film transistor technologies for AMLCDs

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays ◽

10.1109/amlcd.1995.540964 ◽

2002 ◽

Cited By ~ 4

Author(s):

Tsu-Jae King

Keyword(s):

Thin Film ◽

Polycrystalline Silicon ◽

Thin Film Transistor ◽

Silicon Thin Film

Low temperature processed poly-Si thin-film transistors with thinner LPD-SiO/sub 2/ as gate insulator and its reliability

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays ◽

10.1109/amlcd.1995.540966 ◽

2002 ◽

Author(s):

Ching-Lin Fan ◽

Ching-Fa Yeh ◽

Hsiung-Kuang Tsai ◽

Water Lur ◽

Po-Wen Yen

Keyword(s):

Thin Film ◽

Low Temperature ◽

Thin Film Transistors ◽

Gate Insulator ◽

Si Thin Film

A new CCFL inverter circuit far AMLCD panels results in significantly higher efficiency and brightness

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays ◽

10.1109/amlcd.1995.540976 ◽

2002 ◽

Cited By ~ 5

Author(s):

M.K. Nalbant

Keyword(s):

Inverter Circuit

Electrical performance of top-gate amorphous silicon thin-film transistors

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays ◽

10.1109/amlcd.1995.540955 ◽

2002 ◽

Cited By ~ 1

Author(s):

Chun-Sung Chiang ◽

J. Kanicki ◽

F.R. Libsch

Keyword(s):

Thin Film ◽

Amorphous Silicon ◽

Thin Film Transistors ◽

Electrical Performance ◽

Silicon Thin Film

Electronic properties of PECVD hydrogenated amorphous silicon with predominantly monohydride bonding deposited at less than 150°C

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays ◽

10.1109/amlcd.1995.540951 ◽

2002 ◽

Author(s):

E. Srinivasan ◽

G.N. Parsons

Keyword(s):

Amorphous Silicon ◽

Electronic Properties ◽

Hydrogenated Amorphous Silicon ◽

Hydrogenated Amorphous

A low power driving method for reducing cross-talk in high resolution TFT-LCDs

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays ◽

10.1109/amlcd.1995.540962 ◽

2002 ◽

Cited By ~ 1

Author(s):

F.R. Libseh ◽

A. Lien

Keyword(s):

High Resolution ◽

Low Power ◽

Cross Talk

The use of minienvironments in AMLCD and other FPD manufacturing

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays ◽

10.1109/amlcd.1995.541091 ◽

2002 ◽

Author(s):

V. Cannella ◽

M. Vijan ◽

A. Gregg

An alternative transparent conducting oxide to ITO for the a-Si:H TFT-LCD applications

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays ◽

10.1109/amlcd.1995.540959 ◽

2002 ◽

Cited By ~ 2

Author(s):

Je-Hsiung Lan ◽

J. Kanicki ◽

A. Catalano ◽

J. Keane

Keyword(s):

Transparent Conducting Oxide ◽

Transparent Conducting

The relation between the resistivity of the drain-line/pixel-electrode contact and SiN deposition condition

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays ◽

10.1109/amlcd.1995.540958 ◽

2002 ◽

Author(s):

S. Takanabe ◽

Y. Goto ◽

S. Nagao ◽

H. Nagata ◽

O. Miyakawa ◽

...

Keyword(s):

Deposition Condition ◽

Electrode Contact

An overview of active matrix LCDs in business and technology

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays ◽

10.1109/amlcd.1995.540948 ◽

2002 ◽

Cited By ~ 2

Author(s):

T. Morita

Keyword(s):

Active Matrix

Proceedings of Second International Workshop on Active Matrix Liquid Crystal DisplaysLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Trends in polycrystalline-silicon thin-film transistor technologies for AMLCDs

Low temperature processed poly-Si thin-film transistors with thinner LPD-SiO/sub 2/ as gate insulator and its reliability

A new CCFL inverter circuit far AMLCD panels results in significantly higher efficiency and brightness

Electrical performance of top-gate amorphous silicon thin-film transistors

Electronic properties of PECVD hydrogenated amorphous silicon with predominantly monohydride bonding deposited at less than 150°C

A low power driving method for reducing cross-talk in high resolution TFT-LCDs

The use of minienvironments in AMLCD and other FPD manufacturing

An alternative transparent conducting oxide to ITO for the a-Si:H TFT-LCD applications

The relation between the resistivity of the drain-line/pixel-electrode contact and SiN deposition condition

An overview of active matrix LCDs in business and technology

Proceedings of Second International Workshop on Active Matrix Liquid Crystal Displays
Latest Publications