Use of Scattered Secondary Target Radiation in EDXRF Analysis: A Fundamental-Parameter Method for Matrix Correction

1987 ◽  
pp. 165-174 ◽  
Author(s):  
Tom O’Reilly ◽  
Bi-Shia W. King
1986 ◽  
Vol 30 ◽  
pp. 165-174 ◽  
Author(s):  
Tom O'Reilly ◽  
Bi-Shia W. King

AbstractA new fundamental-parameter program has been developed which corrects for light element absorption based on the mean atomic number of the sample. The mean atomic number, in turn, is determined from the Compton/Rayleigh scatter intensity ratio. The program is quite flexible with regard to the number and the type of standards which may be used. The accuracy and precision of the method has been evaluated with several geological and biological standards. The results are in good agreement with those obtained by some other methods (CEMAS, XRF-11).


1996 ◽  
Author(s):  
F.A. Weber ◽  
L.B. Da Silva ◽  
T.W. Jr. Barbee ◽  
D. Ciarlo ◽  
M. Mantler

2005 ◽  
Vol 20 (2) ◽  
pp. 183-183
Author(s):  
Y. Kataoka ◽  
N. Kawahara ◽  
S. Hara ◽  
Y. Yamada ◽  
T. Matsuo ◽  
...  

1989 ◽  
Vol 33 ◽  
pp. 225-235
Author(s):  
Y. Kataoka ◽  
T. Arai

The fundamental parameter method for x-ray spectrometry has been used most commonly for bulk samples, because it permits an analysis utilizing a minimum number of standards, even for samples with complicated matrices. The need for the analysis of thin film materials, which includes multi-layer films, has been increasing in recent years along with the rapid progress of high technologies. However, there have been few reports that deal with the application of fundamental parameter methods to multi-layer thin films. There may be two situations in the analysis of thin films. In routine analysis of quality control applications, they usually require precise analysis. Fortunately, it is possible to prepare well characterized standards similar to the unknowns.


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