Effect of the sputtering parameters on the physical properties and photocatalytic reactivity of TiO2 thin films prepared by an RF magnetron sputtering deposition method

2012 ◽  
Vol 39 (4) ◽  
pp. 1593-1602 ◽  
Author(s):  
Afshin Ebrahimi ◽  
Masaaki Kitano ◽  
Kazushi Iyatani ◽  
Yu Horiuchi ◽  
Masato Takeuchi ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Physical Properties ◽  
Rf Magnetron Sputtering ◽  
Deposition Method ◽  
Tio2 Thin Films ◽  
Sputtering Deposition ◽  
Magnetron Sputtering Deposition Method

Photocatalytic and Photoelectrochemical Properties of Nitrogen-Substituted TiO2 Thin Films Prepared by an RF Magnetron Sputtering Deposition Method

2007 ◽  
Vol 544-545 ◽  
pp. 107-110 ◽  
Author(s):  
Masaaki Kitano ◽  
Takeshi Kudo ◽  
Masaya Matsuoka ◽  
Michio Ueshima ◽  
Masakazu Anpo
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Visible Light ◽  
Nitrogen Concentration ◽  
Wavelength Region ◽  
Rf Magnetron Sputtering ◽  
O2 Evolution ◽  
Deposition Method ◽  
Tio2 Thin Films ◽  
Sputtering Deposition

Highly nitrogen-substituted TiO2 (N-TiO2) thin film photocatalysts were prepared by a radio-frequency magnetron sputtering (RF-MS) deposition method. N-TiO2 thin films with low nitrogen concentration (0.5%) exhibited a small absorption band as a shoulder in the 400-500 nm wavelength region, indicating that isolated N 2p orbitals are formed above the O 2p orbitals. However, N-TiO2 with higher nitrogen concentration (6%) exhibited a sharp absorption edge at 500 nm, indicating that visible light absorption is due to a band gap transition. These N-TiO2 thin films could operate as photocatalysts to decompose 2-propanol diluted in water under visible light. The band structure of N-TiO2 was also determined by photoelectrochemical measurements and H2 and O2 evolution was carried out from an aqueous solution involving sacrificial reagents.

The Preparation of Visible Light-Responsive TiO2 Thin Films by Applying a RF-Magnetron Sputtering Deposition Method and Their Photocatalytic Reactivity for the Decomposition of Water with a Separate Evolution of H2 and O2

2006 ◽  
Vol 317-318 ◽  
pp. 823-826 ◽  
Author(s):  
Masaaki Kitano ◽  
Hisashi Kikuchi ◽  
Takahiro Hosoda ◽  
Masato Takeuchi ◽  
Masaya Matsuoka ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Visible Light ◽  
Tio2 Thin Film ◽  
Rf Magnetron Sputtering ◽  
Light Irradiation ◽  
Deposition Method ◽  
Sputtering Deposition ◽  
Magnetron Sputtering Deposition Method

TiO2 (Vis-TiO2) thin films absorbing UV and visible light in regions of 250-600nm have been successfully developed by applying a radio-frequency (RF) magnetron sputtering deposition method. SIMS depth profiles of Vis-TiO2 revealed that the O/Ti ratio gradually decreases from the top surface (O/Ti ratio : 2.00 ± 0.01) to the inside (1.93 ± 0.01). This unique declined O/Ti composition (anisotropic structure) may be the origin of the significant perturbation in the electronic structure of Vis-TiO2, enabling the absorption of visible light and their high photocatalytic performance under visible light irradiation. In fact, it was found that the separate evolution of H2 and O2 from water could be successfully achieved under visible light or solar light irradiation by applying these thin film photocatalysts in an H-type glass container separating the two aqueous solutions by a TiO2 thin film and proton-exchange membrane, having H2 evolution from Pt side and O2 evolution from TiO2 thin film side, respectively.

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