ABSTRACTA series of amorphous hydrogenated carbon-nitrogen alloy films (a-CxNyHz) has been prepared via plasma-enhanced chemical vapor deposition from mixtures of nitrogen and acetylene. It is found that as the ratio R=N2/C2H2 is increased from zero to 100, the nitrogen incorporation into the films is increasing while the deposition rate is decreasing for 0<R<10 and is saturating at a value of about 1.0 A/sec for 10<R<100. The absorption associated with the N-H stretching mode increases while that of the C-H stretching mode decreases with increase of R. The optical constants and the energy gaps of these films have also been determined. A free energy model previously developed for the prediction of the bonding in amorphous a-CxHyalloys is extended and applied here to a-CxNyHz. Predictions are presented for the bonding of tetrahedral C(sp3), trigonal C(sp2), linear C(sp1), pyramidal N(sp 3), trigonal N(sp 2), and linear N(sp1) atoms in the alloy, and the bonding of H to these atoms.
Characterization of amorphous hydrogenated carbon films deposited by MFPUMST at different ratios of mixed gases
