Detection of NH (X p3Σ−) by resonance fluorescence in the pulsed vacuum uv photolysis of NH3 and its application to reactions of NH radicals

1976 ◽  
Vol 42 (2) ◽  
pp. 370-372 ◽  
Author(s):  
I. Hansen ◽  
K. Hoinghaus ◽  
C. Zetzsch ◽  
F. Stuhl
Keyword(s):  
Resonance Fluorescence ◽  
Uv Photolysis ◽  
Vacuum Uv

Rate Constant for the Reaction of OH with n-C4H10

1973 ◽  
Vol 28 (8) ◽  
pp. 1383-1384 ◽  
Author(s):  
F. Stuhl
Keyword(s):  
Hydroxyl Radicals ◽  
Rate Constant ◽  
Fluorescence Method ◽  
Oh Radicals ◽  
Resonance Fluorescence ◽  
Kinetic Behavior ◽  
Large Excess ◽  
Uv Photolysis ◽  
Resonance Fluorescence Method ◽  
Vacuum Uv

The kinetic behavior of OH radicals was studied in the presence of a large excess of n-butane. Hydroxyl radicals were produced by pulsed vacuum-uv photolysis of H2O and were monitored directly by a resonance fluorescence method. The rate constant for the reaction OH + n-butane was determined to be 2.35 (±0.35) × 10-12 cm3 molecule-1 sec-1 at 298 °K.

scholarly journals Degradation and transformation of natural organic matter accountable for disinfection byproduct formations by UV photolysis and UV/chlor(am)ine

2018 ◽  
Vol 79 (5) ◽  
pp. 929-937 ◽  
Author(s):  
Chanathip Hirun-Utok ◽  
Songkeart Phattarapattamawong
Keyword(s):  
Organic Matter ◽  
Natural Organic Matter ◽  
Low Pressure ◽  
Haloacetic Acid ◽  
Uv Photolysis ◽  
Disinfection Byproduct ◽  
Proportional Relationship ◽  
Vacuum Uv ◽  
Potential Use

Abstract This research aimed to investigate the degradation of natural organic matter responsible for the formation of trihalomethane (THM), haloacetic acid (HAA) and haloacetonitrile (HAN) during ultraviolet (UV) photolysis and a co-exposure of UV with chlorine (UV/chlorine) and chloramine (UV/chloramine). Low pressure UV (LPUV) and vacuum UV (VUV) lamps were used for photolysis. VUV and LPUV irradiation changed aromatic/unsaturated structures to aliphatic ones, resulting in decreased THM and HAN formation. Following irradiation for 60 min, LPUV decreased THM and HAN by 16% ± 2% and 20% ± 6%, respectively. VUV decreased THM and HAN formation by 23% ± 3% and 20% ± 8%, respectively. HAA formation increased following photolysis. UV/chlorine treatment decreased THM, HAA and HAN. Higher chlorine doses had an inversely proportional relationship with THM and HAN formation. A chlorine dose of 4 mg·L−1 led to the greatest reductions, corresponding to 42% ± 2%, 10% ± 10% and 18% ± 6% for THM, HAA and HAN, respectively. UV/chloramine decreased the formation of THM more than UV/chlorine. With a chloramine dose of 4 mg·L−1, THM, HAA and HAN formation decreased by 74% ± 10%, 10% ± 10% and 11% ± 10%, respectively. This study showed the potential use of UV/chlor(am)ine for controlling the formation of THM, HAA and HAN.

Quantum yields for the production of O(1S), N(2D), and N2(A 3Σ+u) from the vacuum uv photolysis of N2O

1975 ◽  
Vol 62 (11) ◽  
pp. 4266-4273 ◽  
Author(s):  
G. Black ◽  
R. L. Sharpless ◽  
T. G. Slanger ◽  
D. C. Lorents
Keyword(s):  
Quantum Yields ◽  
Uv Photolysis ◽  
Vacuum Uv

Vacuum UV photolysis of n-1-hexene and 4-methyl-1-pentene

1980 ◽  
Vol 12 (3) ◽  
pp. 249-261 ◽  
Author(s):  
Hélène Deslauriers ◽  
Guy J. Collin
Keyword(s):  
Uv Photolysis ◽  
Vacuum Uv

Vacuum uv photolysis of N2O

1974 ◽  
Vol 61 (7) ◽  
pp. 2857-2859 ◽  
Author(s):  
M. J. McEwan ◽  
G. M. Lawrence ◽  
H. M. Poland
Keyword(s):  
Uv Photolysis ◽  
Vacuum Uv
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