Quantitative assessment for cracking in oxide bulk single crystals during Czochralski growth: development of a computer program for thermal stress analysis

1996 ◽  
Vol 162 (1-2) ◽  
pp. 83-88 ◽  
Author(s):  
N. Miyazaki ◽  
H. Uchida ◽  
T. Tsukada ◽  
T. Fukuda
Keyword(s):  
Thermal Stress ◽  
Computer Program ◽  
Stress Analysis ◽  
Single Crystals ◽  
Quantitative Assessment ◽  
Czochralski Growth ◽  
Thermal Stress Analysis ◽  
Bulk Single Crystals ◽  
Growth Development

Thermal stress analysis of silicon bulk single crystal during Czochralski growth

1992 ◽  
Vol 125 (1-2) ◽  
pp. 102-111 ◽  
Author(s):  
N. Miyazaki ◽  
H. Uchida ◽  
T. Munakata ◽  
K. Fujioka ◽  
Y. Sugino
Keyword(s):  
Thermal Stress ◽  
Single Crystal ◽  
Stress Analysis ◽  
Bulk Single Crystal ◽  
Czochralski Growth ◽  
Thermal Stress Analysis ◽  
Silicon Bulk

scholarly journals Thermal Stress Analysis of Silicon Single Crystal during Czochralski Growth.

1992 ◽  
Vol 58 (554) ◽  
pp. 1953-1959
Author(s):  
Noriyuki MIYAZAKI ◽  
Hitoshi UCHIDA ◽  
Tsuyoshi MUNAKATA ◽  
Kazumasa FUJIOKA ◽  
Yuji SUGINO
Keyword(s):  
Thermal Stress ◽  
Single Crystal ◽  
Stress Analysis ◽  
Silicon Single Crystal ◽  
Czochralski Growth ◽  
Thermal Stress Analysis
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