Oxygen and chlorine evolution on niobium-, zirconium- and other metal-nitride amorphous thin film electrodes prepared by the reactive RF sputtering technique

1988 ◽  
Vol 255 (1-2) ◽  
pp. 179-198 ◽  
Author(s):  
Masashi Azuma ◽  
Yoshihiro Nakato ◽  
Hiroshi Tsubomura
Keyword(s):  
Thin Film ◽  
Rf Sputtering ◽  
Metal Nitride ◽  
Chlorine Evolution ◽  
Amorphous Thin Film ◽  
Thin Film Electrodes

Reduction of oxygen to water on cobalt-nitride thin film electrodes prepared by the reactive rf sputtering technique

1988 ◽  
Vol 250 (1) ◽  
pp. 73-82 ◽  
Author(s):  
Masashi Azuma ◽  
Minoru Kashihara ◽  
Yoshihiro Nakato ◽  
Hiroshi Tsubomura
Keyword(s):  
Thin Film ◽  
Rf Sputtering ◽  
Thin Film Electrodes

Growth mechanism of NPD crystal from amorphous thin film by observation of morphology and measuring growth rate

2020 ◽  
Vol 59 (SN) ◽  
pp. SN1015
Author(s):  
Hideyuki Kanehara ◽  
Yuki Araki ◽  
Hiroyasu Katsuno ◽  
Toshitaka Nakada
Keyword(s):  
Thin Film ◽  
Growth Rate ◽  
Growth Mechanism ◽  
Amorphous Thin Film
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