Friction and wear properties of hard carbon films formed on cemented carbides by D.C. plasma chemical vapour deposition

Surface and Coatings Technology ◽

10.1016/0257-8972(88)90146-6 ◽

1988 ◽

Vol 36 (1-2) ◽

pp. 161-169 ◽

Author(s):

Akitsugu Imamura ◽

Tetsuji Tsukamoto ◽

Kunio Shibuki ◽

Sokichi Takatsu

Keyword(s):

Friction And Wear ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Cemented Carbides ◽

Wear Properties ◽

Hard Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Friction And Wear Properties

Download Full-text

Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition

Chinese Physics B ◽

10.1088/1674-1056/17/4/053 ◽

2008 ◽

Vol 17 (4) ◽

pp. 1467-1471 ◽

Author(s):

Gu Guang-Rui ◽

Jin Zhe ◽

Ito Toshimichi

Keyword(s):

Field Emission ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Carbon Films ◽

Quartz Tube ◽

Emission Characteristics ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

Download Full-text

Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition

Chinese Physics B ◽

10.1088/1674-1056/17/2/059 ◽

2008 ◽

Vol 17 (2) ◽

pp. 716-720 ◽

Author(s):

Gu Guang-Rui ◽

Wu Bao-Jia ◽

Jin Zhe ◽

Ito Toshimichi

Keyword(s):

Vapour Deposition ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapour ◽

Carbon Films ◽

Electron Field Emission ◽

Plasma Chemical ◽

Electron Field ◽

Plasma Chemical Vapour Deposition ◽

Resonance Microwave

Download Full-text

Effects of microwave power and bias voltage on deposition of amorphous hydrogenated carbon films using electron cyclotron resonance plasma chemical vapour deposition

Journal of Materials Science Letters ◽

10.1007/bf00776361 ◽

1994 ◽

Vol 13 (24) ◽

pp. 1793-1796 ◽

Author(s):

K. Maruyama ◽

T. Inoue ◽

M. Yamamoto ◽

T. Morinaga ◽

H. Saitoh ◽

...

Keyword(s):

Microwave Power ◽

Cyclotron Resonance ◽

Vapour Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Amorphous Hydrogenated Carbon ◽

Resonance Plasma

Download Full-text

Surface characterisation of carbon films produced by plasma chemical vapour deposition method

Surface Engineering ◽

10.1179/1743294413y.0000000137 ◽

2013 ◽

Vol 29 (6) ◽

pp. 474-478 ◽

Author(s):

A. Khettache ◽

T. Staedler ◽

M. Z. Touhami ◽

H. Weiß ◽

X. Jiang

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Deposition Method ◽

Plasma Chemical ◽

Surface Characterisation ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

Download Full-text

Tribological study of hydrogenated amorphous carbon films with tailored microstructure and composition produced by bias-enhanced plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2010.03.017 ◽

2010 ◽

Vol 19 (7-9) ◽

pp. 1093-1102 ◽

Author(s):

J.G. Buijnsters ◽

M. Camero ◽

L. Vázquez ◽

F. Agulló-Rueda ◽

R. Gago ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Tribological Study ◽

Plasma Chemical Vapour Deposition ◽

Hydrogenated Amorphous

Download Full-text

Vacuum ultraviolet, ultraviolet and visible absorption spectra study of hydrogenated amorphous carbon films prepared by RF plasma chemical vapour deposition

Journal of Materials Science Letters ◽

10.1007/bf00241715 ◽

1993 ◽

Vol 12 (17) ◽

Author(s):

M. Nakayama ◽

M. Shibahara ◽

K. Maruyama ◽

K. Kamata

Keyword(s):

Vacuum Ultraviolet ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Rf Plasma ◽

Plasma Chemical ◽

Visible Absorption ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapour Deposition ◽

Hydrogenated Amorphous

Download Full-text

Properties of carbon films produced by R.F. Plasma chemical vapour deposition

Surface and Coatings Technology ◽

10.1016/0257-8972(90)90023-6 ◽

1990 ◽

Vol 43-44 ◽

pp. 813-820 ◽

Author(s):

Hideki Minagawa ◽

Ichiro Fujita ◽

Tomoaki Hino ◽

Toshiro Yamashina

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

Download Full-text

PROPERTIES OF CARBON FILMS PRODUCED BY R.F. PLASMA CHEMICAL VAPOUR DEPOSITION

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50083-8 ◽

1990 ◽

pp. 813-820

Author(s):

HIDEKI MINAGAWA ◽

ICHIRO FUJITA ◽

TOMOAKI HINO ◽

TOSHIRO YAMASHINA

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

Download Full-text

High-current-density electron emissions from nano-carbon films fabricated by high-power microwave-plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2005.03.004 ◽

2005 ◽

Vol 14 (9) ◽

pp. 1469-1473 ◽

Author(s):

Jiayu Wang ◽

Toshimichi Ito

Keyword(s):

Vapour Deposition ◽

Microwave Plasma ◽

High Current Density ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

High Power Microwave ◽

Plasma Chemical Vapour Deposition ◽

Electron Emissions ◽

Power Microwave

Download Full-text

Effect of mixing oxygen or diborane on the formation of amorphous carbon films from methane by r.f. plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(88)90427-0 ◽

1988 ◽

Vol 163 ◽

pp. 229-232 ◽

Author(s):

C.R. Aiyer ◽

S.A. Gangal ◽

K. Montasser ◽

S. Morita ◽

S. Hattori

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapour Deposition

Download Full-text