Surface characterisation of carbon films produced by plasma chemical vapour deposition method

Surface Engineering ◽

10.1179/1743294413y.0000000137 ◽

2013 ◽

Vol 29 (6) ◽

pp. 474-478 ◽

Author(s):

A. Khettache ◽

T. Staedler ◽

M. Z. Touhami ◽

H. Weiß ◽

X. Jiang

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Deposition Method ◽

Plasma Chemical ◽

Surface Characterisation ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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The temperature dependence of the resistance of diamond film synthesized by microwave plasma chemical vapour deposition method

Vacuum ◽

10.1016/0042-207x(91)91423-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1083

Author(s):

Yang Bangchao ◽

Gou Li ◽

Jia Yuming

Keyword(s):

Temperature Dependence ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Synthesis of cubic BN from the gas phase by a new plasma chemical vapour deposition method using r.f. waves and a tungsten filament

Surface and Coatings Technology ◽

10.1016/0257-8972(90)90066-l ◽

1990 ◽

Vol 43-44 ◽

pp. 116-127 ◽

Author(s):

Yukio Ichinose ◽

Hidetoshi Saitoh ◽

Yoshihiko Hirotsu

Keyword(s):

Gas Phase ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Tungsten Filament ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Development of the quadrupole plasma chemical vapour deposition method for low temperature, high speed coating on an optical fibre

Materials Science and Engineering A ◽

10.1016/0921-5093(91)90600-r ◽

1991 ◽

Vol 139 ◽

pp. 79-84 ◽

Author(s):

Takeshi Kashima ◽

Yoshinobu Matsuda ◽

Hiroshi Fujiyama

Keyword(s):

Low Temperature ◽

Chemical Vapour Deposition ◽

Optical Fibre ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Fabrication of glass-capsuled CdTe microcrystals using laser evaporation and plasma chemical vapour deposition method

Journal of Materials Science ◽

10.1007/bf00975078 ◽

1994 ◽

Vol 29 (5) ◽

pp. 1295-1301

Author(s):

K. Tsunetomo ◽

S. Ohtsuka ◽

T. Koyama ◽

S. Tanaka

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Laser Evaporation ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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SYNTHESIS OF CUBIC BN FROM THE GAS PHASE BY A NEW PLASMA CHEMICAL VAPOUR DEPOSITION METHOD USING R.F. WAVES AND A TUNGSTEN FILAMENT

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50020-6 ◽

1990 ◽

pp. 116-127

Author(s):

YUKIO ICHINOSE ◽

HIDETOSHI SAITOH ◽

YOSHIHIKO HIROTSU

Keyword(s):

Gas Phase ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Tungsten Filament ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition

Chinese Physics B ◽

10.1088/1674-1056/17/4/053 ◽

2008 ◽

Vol 17 (4) ◽

pp. 1467-1471 ◽

Author(s):

Gu Guang-Rui ◽

Jin Zhe ◽

Ito Toshimichi

Keyword(s):

Field Emission ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Carbon Films ◽

Quartz Tube ◽

Emission Characteristics ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Time-dependent evolution of the structure and chemical bonds in diamond-like carbon films generated by the hot filament chemical vapour deposition method

Thin Solid Films ◽

10.1016/0040-6090(93)90756-f ◽

1993 ◽

Vol 232 (1) ◽

pp. 21-27 ◽

Author(s):

M.L. Terranova ◽

V. Sessa ◽

V. Rigato ◽

F. Caccavale ◽

M. Braglia ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Time Dependent ◽

Diamond Like Carbon ◽

Chemical Bonds ◽

Deposition Method ◽

Hot Filament ◽

Chemical Vapour Deposition Method

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Tribological study of hydrogenated amorphous carbon films with tailored microstructure and composition produced by bias-enhanced plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2010.03.017 ◽

2010 ◽

Vol 19 (7-9) ◽

pp. 1093-1102 ◽

Author(s):

J.G. Buijnsters ◽

M. Camero ◽

L. Vázquez ◽

F. Agulló-Rueda ◽

R. Gago ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Tribological Study ◽

Plasma Chemical Vapour Deposition ◽

Hydrogenated Amorphous

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Properties of carbon films produced by R.F. Plasma chemical vapour deposition

Surface and Coatings Technology ◽

10.1016/0257-8972(90)90023-6 ◽

1990 ◽

Vol 43-44 ◽

pp. 813-820 ◽

Author(s):

Hideki Minagawa ◽

Ichiro Fujita ◽

Tomoaki Hino ◽

Toshiro Yamashina

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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